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X
Norasetthekul, S. ( author )
6  Ergebnisse:
Personensuche X
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1

Etch characteristics of HfO 2 films on Si substrates:

Department of Materials Science and Engineering, University of Florida, P.O. Box 116400 Rhines Hall, Gainesville, FL 32611, USA ( host institution ) ; Norasetthekul, S. ( author ) ; Park, P.Y. ( author )...
Applied Surface Science.  , 2002
Link: https://doi.org/10.1016/..
 
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2

Dry etch chemistries for TiO 2 thin films:

Department of Materials Science and Engineering, University of Florida, P.O. Box 116400 Rhines Hall, Gainesville, FL 32611, USA ( host institution ) ; Norasetthekul, S. ( author ) ; Park, P.Y. ( author )...
Applied Surface Science.  , 2001
Link: https://doi.org/10.1016/..
 
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3

Wet and dry etching of Sc 2O 3:

Department of Materials Science and Engineering, University of Florida Rhines Hall, P.O. Box 116400, Gainesville, FL 32611, USA ( host institution ) ; Park, P.Y. ( author ) ; Norasetthekul, S. ( author )...
Applied Surface Science.  , 2001
Link: https://doi.org/10.1016/..
 
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4

Comparison of plasma etch chemistries for MgO:

Department of Materials Science and Engineering, University of Florida, P.O. Box 116400 Rhines Hall, Gainesville, FL 32611, USA ( host institution ) ; Baik, K.H. ( author ) ; Park, P.Y. ( author )...
Applied Surface Science.  , 2001
Link: https://doi.org/10.1016/..
 
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5

Etch characteristics of HfO2 films on Si substrates:

Norasetthekul, S. ; Park, P.Y. ; Baik, K.H....
Applied Surface Science.  187 (2002)  1-2 - p. 75-81 , 2002
Link: https://doi.org/10.1016/..
 
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6

Dry etch chemistries for TiO2 thin films:

Norasetthekul, S. ; Park, P.Y. ; Baik, K.H....
Applied Surface Science.  185 (2001)  1-2 - p. 27-33 , 2001
Link: https://doi.org/10.1016/..
 
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