Onsia, A.
13  Ergebnisse:
Personensuche X
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1

Ethylene Oxide Allergy in Patients on Hemodialysis Waiting ..:

Monbaliu, D. ; Van Breussegem, A. ; Onsia, A....
Transplantation Proceedings.  42 (2010)  10 - p. 4375-4377 , 2010
 
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3

Achieving low-VT Ni-FUSI CMOS via lanthanide incorporation ..:

Veloso, A. ; Yu, H.Y. ; Lauwers, A....
Solid-State Electronics.  52 (2008)  9 - p. 1303-1311 , 2008
 
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5

Strain enhanced FUSI/HfSiON Technology with optimized CMOS ..:

, In: 2007 IEEE Symposium on VLSI Technology,
Veloso, A. ; Arnauts, S. ; Loo, R.... - p. None , 2007
 
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6

Cross-wafer controlled interface layer thickness variation,..:

, In: 2006 European Solid-State Device Research Conference,
 
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7

Demonstration of a New Approach Towards 0.25V Low-Vt CMOS U..:

, In: 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.,
Biesemans, S. ; Absil, P.P. ; Jurczak, M.... - p. 98-99 , 2006
 
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9

The future of high-K on pure germanium and its importance f..:

Meuris, M. ; Delabie, A. ; Van Elshocht, S....
Materials Science in Semiconductor Processing.  8 (2005)  1-3 - p. 203-207 , 2005
 
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10

Deposition of HfO2 on germanium and the impact of surface p..:

Van Elshocht, S. ; Brijs, B. ; Caymax, M....
Applied Physics Letters.  85 (2004)  17 - p. 3824-3826 , 2004
 
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11

Analysis of trace metals in thin silicon nitride films by t..:

Vereecke, G. ; Arnauts, S. ; Van Doorne, P....
Spectrochimica Acta Part B: Atomic Spectroscopy.  56 (2001)  11 - p. 2321-2330 , 2001
 
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