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Padmanaban, Munirathna
15  Ergebnisse:
Personensuche X
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1

Designing an ordered template of cylindrical arrays based o..:

Pinge, Shubham ; Lin, Guanyang ; Baskaran, Durairaj..
Soft Matter.  14 (2018)  4 - p. 597-613 , 2018
Link: https://doi.org/10.1039/..
 
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2

Spin-on Metal Oxides and Their Applications for Next Genera..:

Yao, Huirong ; Mullen, Salem ; Wolfer, Elizabeth...
Journal of Photopolymer Science and Technology.  29 (2016)  1 - p. 59-67 , 2016
Link: https://doi.org/10.2494/..
 
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3

Progress in Spin-on Hard Mask Materials for Advanced Lithog..:

Padmanaban, Munirathna ; Cho, JoonYeon ; Kudo, Takanori...
Journal of Photopolymer Science and Technology.  27 (2014)  4 - p. 503-509 , 2014
Link: https://doi.org/10.2494/..
 
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4

Responding to the Challenge: Materials Design for Immersion..:

Padmanaban, Munirathna ; Romano, Andrew ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  19 (2006)  4 - p. 555-563 , 2006
Link: https://doi.org/10.2494/..
 
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5

Influence of ArF Resist Components and Process Conditions o..:

Padmanaban, Munirathna ; Anyadiegwu, Clement ; Kanda, Takashi...
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 475-481 , 2003
Link: https://doi.org/10.2494/..
 
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6

Optimization of 193 nm Contact Hole Resists for 100 nm Node:

Kudo, Takanori ; Alemy, Eric L. ; Dammel, Ralph R....
Journal of Photopolymer Science and Technology.  15 (2002)  4 - p. 549-558 , 2002
Link: https://doi.org/10.2494/..
 
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7

Etch Properties of 193nm Resists: Issues and Approaches:

Padmanaban, Munirathna ; Alemy, Eric ; Dammel, Ralph...
Journal of Photopolymer Science and Technology.  15 (2002)  3 - p. 521-527 , 2002
Link: https://doi.org/10.2494/..
 
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8

Materials and Resists for 193 and 157nm Applications:

Padmanaban, Munirathna ; Alemy, Eric ; Bae, Jun-Bom...
Journal of Photopolymer Science and Technology.  14 (2001)  4 - p. 631-642 , 2001
Link: https://doi.org/10.2494/..
 
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9

Mechanistic Studies on the CD Degradation of 193nm Resists ..:

Kudo, Takanori ; Dammel, Ralph R. ; Bae, Jun-Born...
Journal of Photopolymer Science and Technology.  14 (2001)  3 - p. 407-417 , 2001
Link: https://doi.org/10.2494/..
 
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10

Layer-Specific Resists for 193nm Lithography:

Padmanaban, Munirathna ; Bae, Jun-Bom ; Kim, Woo-Kyu...
Journal of Photopolymer Science and Technology.  13 (2000)  4 - p. 607-615 , 2000
Link: https://doi.org/10.2494/..
 
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11

Sensitized Transparent Photobase Additive For 193 nm Lithog..:

Padmanaban, Munirathna ; Bae, Jun-Born ; Cook, Michelle...
Journal of Photopolymer Science and Technology.  13 (2000)  4 - p. 617-624 , 2000
Link: https://doi.org/10.2494/..
 
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12

Bottom Anti-Reflective Coatings for DUV Lithography:

Kang, Wen-Bing ; Tanaka, Hatsuyuki ; Kimura, Ken...
Journal of Photopolymer Science and Technology.  10 (1997)  3 - p. 471-477 , 1997
Link: https://doi.org/10.2494/..
 
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13

Progress in acetal based deep UV resist:

Padmanaban, Munirathna ; Kinoshita, Yoshiaki ; Kudo, Takanori...
Journal of Photopolymer Science and Technology.  7 (1994)  3 - p. 461-472 , 1994
Link: https://doi.org/10.2494/..
 
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14

CHEM 122-002: Fundamentals of Chemical Principles II:

Padmanaban, Munirathna
https://digitalcommons.njit.edu/chem-syllabi/60.  , 2019
Link: https://digitalcommons.n..
 
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15

CHEM 122-102: Fundamentals of Chemical Principles II:

Padmanaban, Munirathna
https://digitalcommons.njit.edu/chem-syllabi/61.  , 2019
Link: https://digitalcommons.n..
 
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