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Padmanaban, Murirathna
11  Ergebnisse:
Personensuche X
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1

Functional Properties of Novel Metallic Hard Masks:

Padmanaban, Murirathna ; Cho, Joon Yeon ; Yao, Huirong...
Journal of Photopolymer Science and Technology.  26 (2013)  2 - p. 231-238 , 2013
Link: https://doi.org/10.2494/..
 
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2

Progress in EUV Underlayer Materials:

Yao, Huirong ; Mullen, Salem ; Bogusz, Zachary..
Journal of Photopolymer Science and Technology.  25 (2012)  5 - p. 647-653 , 2012
Link: https://doi.org/10.2494/..
 
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3

PAG and Quencher Effects on DBARC Performance:

Padmanaban, Murirathna ; Kudo, Takanori ; Chakrapani, Srinivasan...
Journal of Photopolymer Science and Technology.  24 (2011)  5 - p. 479-486 , 2011
Link: https://doi.org/10.2494/..
 
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4

Advances and Challenges in Developable Bottom Anti-Reflecti..:

Kudo, Takanori ; Chakrapani, Srinivasan ; Dioses, Alberto...
Journal of Photopolymer Science and Technology.  23 (2010)  5 - p. 731-740 , 2010
Link: https://doi.org/10.2494/..
 
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5

A Novel Resist Freeze Process for Double Imaging:

Abdallah, David J. ; Alemy, Eric ; Chakrapani, Srinivasan..
Journal of Photopolymer Science and Technology.  21 (2008)  5 - p. 655-663 , 2008
Link: https://doi.org/10.2494/..
 
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6

Novel Diamantane Polymer Platform for Resist Applications:

Padmanaban, Murirathna ; Chakrapani, Srinivasan ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  20 (2007)  5 - p. 719-728 , 2007
Link: https://doi.org/10.2494/..
 
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7

Carborane-Based Photoacid Generators: New Superacids For 19..:

Dammel, Ralph R. ; Rahman, M. Dalil ; McKenzie, Douglas...
Journal of Photopolymer Science and Technology.  20 (2007)  5 - p. 627-635 , 2007
Link: https://doi.org/10.2494/..
 
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8

Effect of Amine Additives on LWR and LER as Studied by Extr..:

Houlihan, Francis M. ; Rentkiewicz, David ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  19 (2006)  3 - p. 327-334 , 2006
Link: https://doi.org/10.2494/..
 
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9

Leaching Phenomena and their Suppresion in 193 nm Immersion..:

Dammel, Ralph R. ; Pawlowski, Georg ; Romano, Andrew...
Journal of Photopolymer Science and Technology.  18 (2005)  5 - p. 593-602 , 2005
Link: https://doi.org/10.2494/..
 
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10

Possible Origins and Some Methods to Minimize LER:

Padmanaban, Murirathna ; Rentkiewicz, David ; Hong, Chisun...
Journal of Photopolymer Science and Technology.  18 (2005)  4 - p. 451-456 , 2005
Link: https://doi.org/10.2494/..
 
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11

Contact Hole Resist Solutions for 45-90nm Node Design Rules:

Padmanaban, Murirathna ; Kudo, Takamori ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 489-496 , 2004
Link: https://doi.org/10.2494/..
 
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