E-LIB Suche - Ergebnisse für: Pawlowski, Georg

1

Effective EUV Resist Outgassing Barrier Using a Novel Top C..:

Wang, Xiaowei ; Pawlowski, Georg ; Okayasu, Tetsuo...
Journal of Photopolymer Science and Technology. 28 (2015) 1 - p. 111-117 , 2015

Link: https://doi.org/10.2494/..

2

Leaching Phenomena and their Suppresion in 193 nm Immersion..:

Dammel, Ralph R. ; Pawlowski, Georg ; Romano, Andrew...
Journal of Photopolymer Science and Technology. 18 (2005) 5 - p. 593-602 , 2005

Link: https://doi.org/10.2494/..

3

The Frog Prince. A Brief Review of DUV Resist Technology:

Lee, DongKwan ; Pawlowski, Georg
Journal of Photopolymer Science and Technology. 15 (2002) 3 - p. 427-434 , 2002

Link: https://doi.org/10.2494/..

4

Third-order nonlinear optical properties of porphyrazine, p..:

Nalwa, Hari Singh ; Hanack, Michael ; Pawlowski, Georg.
Chemical Physics. 245 (1999) 1-3 - p. 17-26 , 1999

Link: https://doi.org/10.1016/..

5

Polymer Optimization of Pigmented Photoresists for Color Fi..:

Kudo, Takanori ; Nanjo, Yuki ; Nozaki, Yuko...
Japanese Journal of Applied Physics. 37 (1998) 3R - p. 1010 , 1998

Link: https://doi.org/10.1143/..

6

Optimization of DUV Negative Resists for 0.15 .MU.m Lithogr..:

Kudo, Takanori ; Aramaki, Kayo ; Pawlowski, Georg
Journal of Photopolymer Science and Technology. 11 (1998) 3 - p. 445-454 , 1998

Link: https://doi.org/10.2494/..

7

Fabrication Process of Color Filters Using Pigmented Photor..:

Kudo, Takanori ; Nanjo, Yuki ; Yamaguchi, Yuko...
Japanese Journal of Applied Physics. 37 (1998) 6R - p. 3594 , 1998

Link: https://doi.org/10.1143/..

8

Third-order nonlinear optical properties of trans-dihydroxy..:

Nalwa, Hari Singh ; Engel, Michael Klaus ; Hanack, Michael.
Applied Physics Letters. 71 (1997) 15 - p. 2070-2072 , 1997

Link: https://doi.org/10.1063/..

9

Bottom Anti-Reflective Coatings for DUV Lithography:

Kang, Wen-Bing ; Tanaka, Hatsuyuki ; Kimura, Ken...
Journal of Photopolymer Science and Technology. 10 (1997) 3 - p. 471-477 , 1997

Link: https://doi.org/10.2494/..

10

Pigmented Photoresists for Color Filters:

Kudo, Takanori ; Nanjo, Yuki ; Nozaki, Yuko...
Journal of Photopolymer Science and Technology. 9 (1996) 1 - p. 109-119 , 1996

Link: https://doi.org/10.2494/..

11

Pigmented Photoresist for Black Matrix:

Kudo, Takanori ; Nozaki, Yuko ; Nanjo, Yuki...
Journal of Photopolymer Science and Technology. 9 (1996) 1 - p. 121-130 , 1996

Link: https://doi.org/10.2494/..

12

Progress in acetal based deep UV resist:

Padmanaban, Munirathna ; Kinoshita, Yoshiaki ; Kudo, Takanori...
Journal of Photopolymer Science and Technology. 7 (1994) 3 - p. 461-472 , 1994

Link: https://doi.org/10.2494/..

13

Application aspects of a positive tone deep UV resist:

Spiess, Walter ; Röschert, Horst ; Wengenroth, Horst.
Microelectronic Engineering. 21 (1993) 1-4 - p. 267-270 , 1993

Link: https://doi.org/10.1016/..

14

Chemical amplification & dissolution inhibition: a novel hi..:

PAWLOWSKI, GEORG ; PRZYBILLA, KLAUS-JÜRGEN ; SPIESS, WALTER..
Journal of Photopolymer Science and Technology. 5 (1992) 1 - p. 55-66 , 1992

Link: https://doi.org/10.2494/..

15

t‐BOC blocked hydroxyphenyl‐methacrylates: On the way to qu..:

Przybilla, Klaus‐jürgen ; Dammel, Ralph ; Pawlowski, Georg..
Polymer Engineering & Science. 32 (1992) 20 - p. 1516-1522 , 1992

Link: https://doi.org/10.1002/..