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Peckerar, M.
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1

New applications and emerging technologies in nanolithograp..:

, In: Nanolithography,
Yesilkoy, F. ; Ropp, C. ; Cummins, Z.... - p. 538-550 , 2014
Link: https://doi.org/10.1533/..
 
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2

Compact modeling of 0.35μm SOI CMOS technology node for 4K ..:

Akturk, A. ; Peckerar, M. ; Eng, K....
Microelectronic Engineering.  87 (2010)  12 - p. 2518-2524 , 2010
Link: https://doi.org/10.1016/..
 
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3

Design and testing of a self-powered 3D integrated SOI CMOS..:

Dilli, Z. ; Goldsman, N. ; Peckerar, M...
Microelectronic Engineering.  85 (2008)  2 - p. 388-394 , 2008
Link: https://doi.org/10.1016/..
 
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4

Sensor sensitivity training:

Peckerar, M. ; Perkins, F.K. ; Hodge-Miller, A....
IEEE Circuits and Devices Magazine.  19 (2003)  2 - p. 17-24 , 2003
Link: https://doi.org/10.1109/..
 
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5

Athermal annealing of low-energy boron implants in silicon:

Donnelly, D. W. ; Covington, B. C. ; Grun, J....
Applied Physics Letters.  78 (2001)  14 - p. 2000-2002 , 2001
Link: https://doi.org/10.1063/..
 
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6

Athermal annealing of phosphorus-ion-implanted silicon:

Grun, J. ; Fischer, R. P. ; Peckerar, M....
Applied Physics Letters.  77 (2000)  13 - p. 1997-1999 , 2000
Link: https://doi.org/10.1063/..
 
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7

Session 12 Device technology — Advanced fabrication technol..:

, In: 1986 International Electron Devices Meeting,
Peckerar, M. ; Shott, J. - p. 291 , 1986
Link: https://doi.org/10.1109/..
 
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8

Session 25 Device technology — Contact and interconnect tec..:

, In: 1985 International Electron Devices Meeting,
Peckerar, M. ; Clemens, J. - p. 585 , 1985
Link: https://doi.org/10.1109/..
 
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9

Properties of magnetron sputtered hydrogenated amorphous si..:

Stein, H. J. ; Peercy, P. S. ; Peckerar, M.
Journal of Electronic Materials.  10 (1981)  4 - p. 797-810 , 1981
Link: https://doi.org/10.1007/..
 
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10

Improved GaN materials and devices through confined epitaxy:

Eddy Jr., C. R. ; Holm, R. T. ; Henry, R. L....
Applied Physics Letters.  90 (2007)  16 - p. , 2007
Link: https://doi.org/10.1063/..
 
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11

Gap control in the fabrication of quantum-effect devices us..:

Burkhardt, M. ; Silverman, S. ; Smith, Henry I....
Microelectronic Engineering.  27 (1995)  1-4 - p. 307-310 , 1995
Link: https://doi.org/10.1016/..
 
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12

Reactive ion etching of high-aspect-ratio 100 nm linewidth ..:

Chu, W. ; Foster, K. W. ; Shirey, L. M....
Applied Physics Letters.  64 (1994)  16 - p. 2172-2174 , 1994
Link: https://doi.org/10.1063/..
 
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13

Deep UV photochemistry and patterning of self-assembled mon..:

Calvert, J.M. ; Georger, J.H. ; Schnur, J.M....
Thin Solid Films.  210-211 (1992)  - p. 359-363 , 1992
Link: https://doi.org/10.1016/..
 
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14

A novel test structure for grating pitch determination with..:

Peckerar, M. C. ; Rhee, K. W. ; Ho, P.-T..
Journal of Applied Physics.  68 (1990)  10 - p. 5381-5382 , 1990
Link: https://doi.org/10.1063/..
 
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15

Neural networks & tactile imaging:

Pati, Y.C. ; Krishnaprasad, P.S. ; Peckerar, M.C..
Neural Networks.  1 (1988)  - p. 459 , 1988
Link: https://doi.org/10.1016/..
 
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