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Pollentier, Ivan
17  Ergebnisse:
Personensuche X
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1

Self-assembled monolayers as inhibitors for area-selective ..:

Lodha, Jayant K. ; Pollentier, Ivan ; Conard, Thierry...
Applied Surface Science.  606 (2022)  - p. 154657 , 2022
Link: https://doi.org/10.1016/..
 
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2

SIMS Analysis of Thin EUV Photoresist Films:

Spampinato, Valentina ; Franquet, Alexis ; De Simone, Danilo...
Analytical Chemistry.  94 (2022)  5 - p. 2408-2415 , 2022
Link: https://doi.org/10.1021/..
 
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3

Extreme Ultraviolet-Printability and Mechanistic Studies of..:

Rathore, Ashish ; Pollentier, Ivan ; Cipriani, Maicol...
ACS Applied Polymer Materials.  3 (2021)  4 - p. 1964-1972 , 2021
Link: https://doi.org/10.1021/..
 
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4

Effect of molecular weight on the EUV-printability of main ..:

Rathore, Ashish ; Pollentier, Ivan ; Singh, Harpreet...
Journal of Materials Chemistry C.  8 (2020)  17 - p. 5958-5966 , 2020
Link: https://doi.org/10.1039/..
 
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5

Correction: Effect of molecular weight on the EUV-printabil..:

Rathore, Ashish ; Pollentier, Ivan ; Singh, Harpreet...
Journal of Materials Chemistry C.  8 (2020)  17 - p. 5967-5967 , 2020
Link: https://doi.org/10.1039/..
 
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6

Photoresist Absorption Measurement at Extreme Ultraviolet (..:

Shehzad, Atif ; Vesters, Yannick ; Simone, Danilo De...
Journal of Photopolymer Science and Technology.  32 (2019)  1 - p. 57-66 , 2019
Link: https://doi.org/10.2494/..
 
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7

Metal-containing Materials as Turning Point of EUV Lithogra..:

De Simone, Danilo ; Pollentier, Ivan ; Vandenberghe, Geert
Journal of Photopolymer Science and Technology.  28 (2015)  4 - p. 507-514 , 2015
Link: https://doi.org/10.2494/..
 
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8

High throughput grating qualification of directed self-asse..:

Van Look, Lieve ; Rincon Delgadillo, Paulina ; Lee, Yu-tsung...
Microelectronic Engineering.  123 (2014)  - p. 175-179 , 2014
Link: https://doi.org/10.1016/..
 
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9

Readiness of EUV Lithography for Insertion into Manufacturi..:

Hendrickx, Eric ; Gronheid, Roel ; Hermans, Jan...
Journal of Photopolymer Science and Technology.  26 (2013)  5 - p. 587-593 , 2013
Link: https://doi.org/10.2494/..
 
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10

High Throughput Grating Qualification for Rating Directed S..:

Gronheid, Roel ; Van Look, Lieve ; Delgadillo, Paulina Rincon...
Journal of Photopolymer Science and Technology.  26 (2013)  2 - p. 147-152 , 2013
Link: https://doi.org/10.2494/..
 
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11

Assessment of Challenges in EUV Resist Outgassing and Conta..:

Pollentier, Ivan ; Lokasani, Ragava ; Gronheid, Roel
Journal of Photopolymer Science and Technology.  25 (2012)  5 - p. 609-616 , 2012
Link: https://doi.org/10.2494/..
 
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12

EUV Resist Process Performance Investigations on the NXE310..:

Goethals, Anne-Marie ; Foubert, Philippe ; Hosokawa, Kohei...
Journal of Photopolymer Science and Technology.  25 (2012)  5 - p. 559-567 , 2012
Link: https://doi.org/10.2494/..
 
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13

Chain scission resists for extreme ultraviolet lithography ..:

Lawrie, Kirsten J. ; Blakey, Idriss ; Blinco, James P....
Journal of Materials Chemistry.  21 (2011)  15 - p. 5629 , 2011
Link: https://doi.org/10.1039/..
 
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14

Extreme ultraviolet (EUV) degradation of poly(olefin sulfon..:

Lawrie, Kirsten ; Blakey, Idriss ; Blinco, James...
Radiation Physics and Chemistry.  80 (2011)  2 - p. 236-241 , 2011
Link: https://doi.org/10.1016/..
 
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15

Study of EUV Resist Outgassing/Contamination for Device Int..:

Pollentier, Ivan
Journal of Photopolymer Science and Technology.  23 (2010)  5 - p. 605-612 , 2010
Link: https://doi.org/10.2494/..
 
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