E-LIB Suche - Ergebnisse für: Rammula, Raul

1

Memory Effects in Nanolaminates of Hafnium and Iron Oxide F..:

Kalam, Kristjan ; Otsus, Markus ; Kozlova, Jekaterina...
Nanomaterials. 12 (2022) 15 - p. 2593 , 2022

Link: https://doi.org/10.3390/..

2

Atomic layer deposited nanolaminates of zirconium oxide and..:

Kalam, Kristjan ; Rammula, Raul ; Ritslaid, Peeter...
Nanotechnology. 32 (2021) 33 - p. 335703 , 2021

Link: https://doi.org/10.1088/..

3

Influence of oxygen precursors on atomic layer deposition o..:

Aarik, Lauri ; Arroval, Tõnis ; Mändar, Hugo..
Applied Surface Science. 530 (2020) - p. 147229 , 2020

Link: https://doi.org/10.1016/..

4

Influence of phase composition on optical properties of TiO..:

Möls, Kristel ; Aarik, Lauri ; Mändar, Hugo...
Optical Materials. 96 (2019) - p. 109335 , 2019

Link: https://doi.org/10.1016/..

5

Effect of substrate-enhanced and inhibited growth on atomic..:

Arroval, Tõnis ; Aarik, Lauri ; Rammula, Raul..
Thin Solid Films. 600 (2016) - p. 119-125 , 2016

Link: https://doi.org/10.1016/..

6

Growth of Ti Al1−Ofilms by atomic layer deposition using su..:

Arroval, Tõnis ; Aarik, Lauri ; Rammula, Raul.
Thin Solid Films. 591 (2015) - p. 276-284 , 2015

Link: https://doi.org/10.1016/..

7

Atomic layer deposition of rutile and TiO2-II from TiCl4 an..:

Möldre, Kristel ; Aarik, Lauri ; Mändar, Hugo...
Journal of Crystal Growth. 428 (2015) - p. 86-92 , 2015

Link: https://doi.org/10.1016/..

8

Nanoscale Characterization of TiO2 Films Grown by Atomic La..:

Murakami, Katsuhisa ; Rommel, Mathias ; Hudec, Boris...
ACS Applied Materials & Interfaces. 6 (2014) 4 - p. 2486-2492 , 2014

Link: https://doi.org/10.1021/..

9

Atomic layer deposition of high-quality Al2O3 and Al-doped ..:

Aarik, Lauri ; Arroval, Tõnis ; Rammula, Raul...
Thin Solid Films. 565 (2014) - p. 19-24 , 2014

Link: https://doi.org/10.1016/..

10

Influence of process parameters on atomic layer deposition ..:

Aarik, Lauri ; Alles, Harry ; Aidla, Aleks...
Thin Solid Films. 565 (2014) - p. 37-44 , 2014

Link: https://doi.org/10.1016/..

11

Atomic layer deposition of high-k dielectrics on carbon nan..:

Tamm, Aile ; Peikolainen, Anna-Liisa ; Kozlova, Jekaterina...
Thin Solid Films. 538 (2013) - p. 16-20 , 2013

Link: https://doi.org/10.1016/..

12

Impact of plasma treatment on electrical properties of TiO2..:

Hudec, Boris ; Hušeková, Kristína ; Rosová, Alica...
Journal of Physics D: Applied Physics. 46 (2013) 38 - p. 385304 , 2013

Link: https://doi.org/10.1088/..

13

TiO2-Based Metal-Insulator-Metal Structures for Future DRAM..:

Fröhlich, Karol ; Hudec, Boris ; Ťapajna, Milan...
ECS Transactions. 50 (2013) 13 - p. 79-87 , 2013

Link: https://doi.org/10.1149/..

14

Atomic layer deposition of epitaxial HfO2 thin films on r-c..:

Mändar, Hugo ; Rammula, Raul ; Aidla, Aleks.
Journal of Materials Research. 28 (2013) 13 - p. 1680-1686 , 2013

Link: https://doi.org/10.1557/..

15

Atomic layer deposition of TiO2 from TiCl4 and O3:

Aarik, Lauri ; Arroval, Tõnis ; Rammula, Raul...
Thin Solid Films. 542 (2013) - p. 100-107 , 2013

Link: https://doi.org/10.1016/..