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X
Rentkiewicz, David
6  Ergebnisse:
Personensuche X
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1

Carborane-Based Photoacid Generators: New Superacids For 19..:

Dammel, Ralph R. ; Rahman, M. Dalil ; McKenzie, Douglas...
Journal of Photopolymer Science and Technology.  20 (2007)  5 - p. 627-635 , 2007
Link: https://doi.org/10.2494/..
 
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2

Effect of Amine Additives on LWR and LER as Studied by Extr..:

Houlihan, Francis M. ; Rentkiewicz, David ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  19 (2006)  3 - p. 327-334 , 2006
Link: https://doi.org/10.2494/..
 
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3

Possible Origins and Some Methods to Minimize LER:

Padmanaban, Murirathna ; Rentkiewicz, David ; Hong, Chisun...
Journal of Photopolymer Science and Technology.  18 (2005)  4 - p. 451-456 , 2005
Link: https://doi.org/10.2494/..
 
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4

Recent Advances in the Design of Resist Materials for 157 n..:

Houlihan, Francis ; Sakamuri, Raj ; Romano, Andrew...
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 621-630 , 2004
Link: https://doi.org/10.2494/..
 
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5

193 nm Immersion Lithography-Taking the Plunge:

Dammel, Ralph ; Houlihan, Frank M. ; Sakamuri, Raj..
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 587-601 , 2004
Link: https://doi.org/10.2494/..
 
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6

New Fluorinated Resins for 157 nm Lithography Application:

Houlihan, Francis ; Romano, Andrew ; Rentkiewicz, David...
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 581-590 , 2003
Link: https://doi.org/10.2494/..
 
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