E-LIB Suche - Ergebnisse für: Rhallabi, Ahmed

1

Modelling of photovoltaic production and electrochemical st..:

Cosson, Mickael ; David, Benjamin ; Arzel, Ludovic..
eScience. 2 (2022) 2 - p. 235-241 , 2022

Link: https://doi.org/10.1016/..

2

AlN Etching under ICP Cl2/BCl3/Ar Plasma Mixture: Experimen..:

Rammal, Mohammad ; Rhallabi, Ahmed ; Néel, Delphine...
MRS Advances. 4 (2019) 27 - p. 1579-1587 , 2019

Link: https://doi.org/10.1557/..

3

Theoretical study of the electronic structure of mono-bromi..:

Hamade, Yaman ; Taher, Fadia ; Haidar, Yehya.
Journal of Molecular Modeling. 25 (2019) 8 - p. , 2019

Link: https://doi.org/10.1007/..

4

Monte Carlo Poration Model of Cell Membranes for Applicatio..:

Zerrouki, Amel ; Yousfi, Mohammed ; Rhallabi, Ahmed..
Plasma Processes and Polymers. 13 (2015) 6 - p. 633-648 , 2015

Link: https://doi.org/10.1002/..

5

Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture:..:

Chanson, Romain ; Rhallabi, Ahmed ; Fernandez, Marie Claude.
Plasma Processes and Polymers. 10 (2012) 3 - p. 213-224 , 2012

Link: https://doi.org/10.1002/..

6

A unified analytical and scalable lumped model of RF CMOS s..:

Salimy, Siamak ; Goullet, Antoine ; Rhallabi, Ahmed...
Solid-State Electronics. 61 (2011) 1 - p. 38-45 , 2011

Link: https://doi.org/10.1016/..

7

Introduction of defects during the dry etching of InP photo..:

Avella, Manuel ; Jiménez, Juan ; Pommereau, Frédéric..
Journal of Materials Science: Materials in Electronics. 19 (2008) S1 - p. 171-175 , 2008

Link: https://doi.org/10.1007/..

8

Surface and plasma simulation of deposition processes: CH4 ..:

Mantzaris, Nikolaos V. ; Gogolides, Evangelos ; Boudouvis, Andreas G...
Journal of Applied Physics. 79 (1996) 7 - p. 3718-3729 , 1996

Link: https://doi.org/10.1063/..

9

RF Plasmas in Methane: Prediction of Plasma Properties and ..:

Gogolides, Evangelos ; Mary, David ; Rhallabi, Ahmed.
Japanese Journal of Applied Physics. 34 (1995) 1R - p. 261 , 1995

Link: https://doi.org/10.1143/..

10

Growth of nodular defects during film deposition:

Dubost, Laurent ; Rhallabi, Ahmed ; Perrin, Jérôme.
Journal of Applied Physics. 78 (1995) 6 - p. 3784-3791 , 1995

Link: https://doi.org/10.1063/..

11

Modelling of photovoltaic production and electrochemical st..:

Cosson, Mickael ; David, Benjamin ; Arzel, Ludovic..
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.esci.2022.02.004. , 2022

Link: https://hal.science/hal-..

12

Modelling of photovoltaic production and electrochemical st..:

Cosson, Mickael ; David, Benjamin ; Arzel, Ludovic..
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.esci.2022.02.004. , 2022

Link: https://hal.science/hal-..

13

Surface composition and micromasking effect during the etch..:

Meyer, Thibaut ; Girard, Aurelie ; Le Dain, Guillaume...
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.apsusc.2021.149192. , 2021

Link: https://hal.science/hal-..

14

Etching of iron and iron–chromium alloys using ICP-RIE chlo..:

Le Dain, Guillaume ; Laourine, Feriel ; Guilet, Stéphane...
info:eu-repo/semantics/altIdentifier/doi/10.1088/1361-6595/ac1714. , 2021

Link: https://hal.archives-ouv..

15

Etching of iron and iron–chromium alloys using ICP-RIE chlo..:

Le Dain, Guillaume ; Laourine, Feriel ; Guilet, Stéphane...
info:eu-repo/semantics/altIdentifier/doi/10.1088/1361-6595/ac1714. , 2021

Link: https://hal.science/hal-..