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Santillan, Julius Joseph
93  Ergebnisse:
Personensuche X
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1

Stochastic defect generation depending on tetraalkylhydroxi..:

Harumoto, Masahiko ; dos Santos, Andreia Figueiredo ; Santillan, Julius Joseph..
Japanese Journal of Applied Physics.  62 (2023)  1 - p. 016503 , 2023
Link: https://doi.org/10.35848..
 
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2

Photoresist stochastic defect generation depending on alkyl..:

Harumoto, Masahiko ; dos Santos, Andreia Figueiredo ; Santillan, Julius Joseph..
Japanese Journal of Applied Physics.  62 (2023)  SG - p. SG1037 , 2023
Link: https://doi.org/10.35848..
 
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3

Effect of Alternative Developer Solutions on EUVL Patternin:

Santillan, Julius Joseph ; Shimizu, Kyoko ; Otogawa, Ryuichi.
Journal of Photopolymer Science and Technology.  35 (2022)  1 - p. 67-74 , 2022
Link: https://doi.org/10.2494/..
 
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4

Dependence of photoresist dissolution dynamics in alkaline ..:

Harumoto, Masahiko ; Santillan, Julius Joseph ; Itani, Toshiro.
Japanese Journal of Applied Physics.  61 (2022)  5 - p. 056506 , 2022
Link: https://doi.org/10.35848..
 
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5

Pattern collapse mitigation by controlling atmosphere durin..:

Harumoto, Masahiko ; Motono, Tomohiro ; dos Santos, Andreia Figueiredo...
Japanese Journal of Applied Physics.  60 (2021)  SC - p. SCCA03 , 2021
Link: https://doi.org/10.35848..
 
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6

Application of ethyltrimethylammonium hydroxide (ETMAH) as ..:

Santillan, Julius Joseph ; Harumoto, Masahiko ; Motono, Tomohiro...
Japanese Journal of Applied Physics.  60 (2021)  SC - p. SCCC01 , 2021
Link: https://doi.org/10.35848..
 
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7

Reaction mechanism of ZrO xmetal resists with extreme ultra..:

Yamashita, Yoshiyuki ; Chikyow, Toyohiro ; Santillan, Julius Joseph.
Japanese Journal of Applied Physics.  58 (2019)  SD - p. SDDC01 , 2019
Link: https://doi.org/10.7567/..
 
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8

Dependence of relationship between chemical gradient and li..:

Kozawa, Takahiro ; Nakajima, Ayako ; Yamada, Teppei...
Japanese Journal of Applied Physics.  58 (2019)  3 - p. 036501 , 2019
Link: https://doi.org/10.7567/..
 
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9

Alternative Developer Solutions and Processes for EUV and A..:

Harumoto, Masahiko ; Santillan, Julius Joseph ; Nakayama, Chisayo...
Journal of Photopolymer Science and Technology.  32 (2019)  2 - p. 321-326 , 2019
Link: https://doi.org/10.2494/..
 
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10

Pulse radiolysis of methacrylic acid ligand for zirconia na..:

Yamada, Teppei ; Ishihara, Satoshi ; Muroya, Yusa...
Japanese Journal of Applied Physics.  58 (2019)  3 - p. 036503 , 2019
Link: https://doi.org/10.7567/..
 
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11

Relationship between Resolution Blur and Stochastic Defect ..:

Kozawa, Takahiro ; Santillan, Julius Joseph ; Itani, Toshiro
Journal of Photopolymer Science and Technology.  32 (2019)  1 - p. 161-167 , 2019
Link: https://doi.org/10.2494/..
 
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12

Resist Patterning Characteristics using KrF Laser-ablation ..:

Yamaoka, Hiroshi ; Santillan, Julius Joseph ; Uemori, Nobutaka.
Journal of Photopolymer Science and Technology.  32 (2019)  2 - p. 355-360 , 2019
Link: https://doi.org/10.2494/..
 
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13

Characterization Studies on Metal-based EUV Resist Film Pro..:

Santillan, Julius Joseph ; Itani, Toshiro
Journal of Photopolymer Science and Technology.  31 (2018)  5 - p. 663-667 , 2018
Link: https://doi.org/10.2494/..
 
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14

Electron–hole pairs generated in ZrO2nanoparticle resist up..:

Kozawa, Takahiro ; Santillan, Julius Joseph ; Itani, Toshiro
Japanese Journal of Applied Physics.  57 (2018)  2 - p. 026501 , 2018
Link: https://doi.org/10.7567/..
 
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15

Relationship between Resolution Blur and Shot Noise in Line..:

Kozawa, Takahiro ; Santillan, Julius Joseph ; Itani, Toshiro
Journal of Photopolymer Science and Technology.  31 (2018)  2 - p. 183-188 , 2018
Link: https://doi.org/10.2494/..
 
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