Shida, Naomi
29  Ergebnisse:
Personensuche X
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3

F2 Laser Resist with Fluorinated Polymers:

Naito, Takuya ; Saito, Satoshi ; Shida, Naomi.
Journal of Photopolymer Science and Technology.  15 (2002)  4 - p. 689-692 , 2002
 
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4

Advanced Materials for 193-nm Resists:

Shida, Naomi ; Ushirogouchi, Tohru ; Asakawa, Koji...
Journal of Photopolymer Science and Technology.  13 (2000)  4 - p. 601-606 , 2000
 
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5

Resists Using the Absorption Band Shift Method for ArF Exci..:

Okino, Takeshi ; Asakawa, Koji ; Shida, Naomi.
Journal of Photopolymer Science and Technology.  11 (1998)  3 - p. 489-492 , 1998
 
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6

Dissolution Inhibitors for 193-nm Chemically Amplified Resi..:

Ushirogouchi, Tohru ; Asakawa, Koji ; Okino, Takeshi...
Japanese Journal of Applied Physics.  36 (1997)  12S - p. 7625 , 1997
 
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7

Study of Copolymer Properties for ArF Excimer Laser Resists:

Asakawa, Koji ; Ushirogouchi, Tohru ; Shida, Naomi..
Journal of Photopolymer Science and Technology.  10 (1997)  4 - p. 559-560 , 1997
 
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8

Novel ArF Excimer Laser Resists Based on Menthyl Methacryla..:

SHIDA, Naomi ; USHIROGOUCHI, Tohru ; ASAKAWA, Kohji.
Journal of Photopolymer Science and Technology.  9 (1996)  3 - p. 457-464 , 1996
 
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10

Environmentally friendly water-soluble resists via chemical..:

SHIDA, Naomi ; USHIROGOUCHI, Tohru ; NAKASE, Makoto
Journal of Photopolymer Science and Technology.  8 (1995)  1 - p. 173-178 , 1995
 
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11

Tricycloillicinone, a Novel Prenylated C6-C3 Compound Incre..:

FUKUYAMA, Yoshiyasu ; SHIDA, Naomi ; KODAMA, Mitsuaki..
Chemical and Pharmaceutical Bulletin.  43 (1995)  12 - p. 2270-2272 , 1995
 
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12

Highly Transparent Chemically Amplified ArF Excimer Laser R..:

Naito, Takuya ; Asakawa, Koji ; Shida, Naomi..
Japanese Journal of Applied Physics.  33 (1994)  12S - p. 7028 , 1994
 
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15

New Chlorine-Containing Prenylated C6-C3 Compounds Increasi..:

FUKUYAMA, Yoshiyasu ; OKAMOTO, Kazumi ; KUBO, Youko..
Chemical and Pharmaceutical Bulletin.  42 (1994)  10 - p. 2199-2201 , 1994
 
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