E-LIB Suche - Ergebnisse für: Shiono, Daiju

1

EUV Resist Chemical Analysis by Soft X-ray Absorption Spect..:

Emura, Kazuya ; Watanabe, Takeo ; Yamaguchi, Masato...
Journal of Photopolymer Science and Technology. 27 (2014) 5 - p. 631-638 , 2014

Link: https://doi.org/10.2494/..

2

EUV Resist Chemical Reaction Analysis using SR:

Watanabe, Takeo ; Emura, Kazuya ; Shiono, Daiju...
Journal of Photopolymer Science and Technology. 26 (2013) 5 - p. 635-641 , 2013

Link: https://doi.org/10.2494/..

3

Chemical Reaction Analysis of EUV CA Resist using SR Absorp..:

Watanabe, Takeo ; Haruyama, Yuichi ; Shiono, Daiju...
Journal of Photopolymer Science and Technology. 25 (2012) 5 - p. 569-573 , 2012

Link: https://doi.org/10.2494/..

4

Fundamental Decomposition Analysis of Chemically Amplified ..:

Shiono, Daiju ; Hada, Hideo ; Sato, Kazufumi...
Journal of Photopolymer Science and Technology. 23 (2010) 5 - p. 649-655 , 2010

Link: https://doi.org/10.2494/..

5

Decomposition and Roughness Analysis of Chemically Amplifie..:

Shiono, Daiju ; Hada, Hideo ; Sato, Kazufumi...
Japanese Journal of Applied Physics. 49 (2010) 6S - p. 06GF05 , 2010

Link: https://doi.org/10.1143/..

6

Lithographic Evaluation of Chemically Amplified Molecular R..:

Shiono, Daiju ; Hada, Hideo ; Sato, Kazufumi...
Journal of Photopolymer Science and Technology. 22 (2009) 6 - p. 737-741 , 2009

Link: https://doi.org/10.2494/..

7

Decomposition Analysis of Chemically Amplified Resists for ..:

Shiono, Daiju ; Hada, Hideo ; Hirayama, Taku...
Japanese Journal of Applied Physics. 48 (2009) 6S - p. 06FC08 , 2009

Link: https://doi.org/10.1143/..

8

Patterning capability of new molecular resist in EUV lithog..:

Oizumi, Hiroaki ; Tanaka, Yuusuke ; Kumise, Takaaki...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1049-1053 , 2007

Link: https://doi.org/10.1016/..

9

Evaluation of New Molecular Resist for EUV Lithography:

Oizumi, Hiroaki ; Tanaka, Yuusuke ; Kumise, Takaaki...
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 403-410 , 2007

Link: https://doi.org/10.2494/..

10

Characterization of Negative-Tone Molecular Resist for EUV ..:

Kojima, Kyoko ; Mori, Shigeki ; Shiono, Daiju..
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 429-436 , 2007

Link: https://doi.org/10.2494/..

11

LER evaluation of molecular resist for EUV lithography:

Shiono, Daiju ; Hada, Hideo ; Yukawa, Hiroto...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1084-1087 , 2007

Link: https://doi.org/10.1016/..

12

Performance of molecular resist based on polyphenol in EUV ..:

Oizumi, Hiroaki ; Kumasaka, Fumiaki ; Tanaka, Yuusuke...
Microelectronic Engineering. 83 (2006) 4-9 - p. 1107-1110 , 2006

Link: https://doi.org/10.1016/..

13

Molecular Resists Based on Cholate Derivatives for Electron..:

Shiono, Daiju ; Hirayama, Taku ; Kasai, Kohei...
Japanese Journal of Applied Physics. 45 (2006) 6S - p. 5435 , 2006

Link: https://doi.org/10.1143/..

14

Depth profile and line‐edge roughness of partially O‐1‐etho..:

Hirayama, Taku ; Shiono, Daiju ; Onodera, Junichi..
Polymers for Advanced Technologies. 17 (2006) 2 - p. 116-121 , 2006

Link: https://doi.org/10.1002/..

15

Depth Profile and Line-Edge Roughness of Low-Molecular-Weig..:

Hirayama, Taku ; Shiono, Daiju ; Matsumaru, Shogo...
Japanese Journal of Applied Physics. 44 (2005) 7S - p. 5484 , 2005

Link: https://doi.org/10.1143/..