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Shiratani, Motohiro
4  Ergebnisse:
Personensuche X
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1

Novel EUV Photoresist for Sub-7 nm Node:

Suzuki, Junya ; Furukawa, Tsuyoshi ; Miyata, Hiromu...
Journal of Photopolymer Science and Technology.  30 (2017)  6 - p. 671-674 , 2017
Link: https://doi.org/10.2494/..
 
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2

Novel EUV Resist Development for Sub-14nm Half Pitch:

Kimoto, Takakazu ; Naruoka, Takehiko ; Nakagawa, Hisashi...
Journal of Photopolymer Science and Technology.  28 (2015)  4 - p. 519-523 , 2015
Link: https://doi.org/10.2494/..
 
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3

Novel EUV Resists Materials for 16nm HP and beyond:

Sakai, Kazunori ; Shiratani, Motohiro ; Fujisawa, Tomohisa...
Journal of Photopolymer Science and Technology.  27 (2014)  5 - p. 639-644 , 2014
Link: https://doi.org/10.2494/..
 
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4

Effect of time-modulation bias on polysilicon gate etching:

Morimoto, Michikazu ; Tanaka, Motohiro ; Koga, Kazunori.
Japanese Journal of Applied Physics.  62 (2023)  SI - p. SI1011 , 2023
Link: https://doi.org/10.35848..
 
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