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Tanaka, Hatsuyuki
7  Ergebnisse:
Personensuche X
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1

Relationship between Dissolution Property and Molecular Wei..:

Yamamoto, Masashi ; Kitai, Ryuta ; Horibe, Yasuharu..
Journal of Photopolymer Science and Technology.  22 (2009)  3 - p. 357-362 , 2009
Link: https://doi.org/10.2494/..
 
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2

Advanced RELACS Technology for ArF Resist:

Terai, Mamoru ; Toyoshima, Toshiyuki ; Ishibashi, Takeo...
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 507-510 , 2003
Link: https://doi.org/10.2494/..
 
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3

Below 100-nm Hole Pattern Formation Using Resolution Enhanc..:

Toyoshima, Toshiyuki ; Ishibashi, Takeo ; Yasuda, Naoki...
Journal of Photopolymer Science and Technology.  15 (2002)  3 - p. 377-378 , 2002
Link: https://doi.org/10.2494/..
 
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4

Top Antireflective Coating Process for 193 nm Lithography:

Takano, Yusuke ; Ijima, Kazuyo ; Akiyama, Yasushi...
Japanese Journal of Applied Physics.  41 (2002)  Part 1, No. 6B - p. 4051-4054 , 2002
Link: https://doi.org/10.1143/..
 
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5

Advanced Micro-Lithography Process with Chemical Shrink Tec..:

Ishibashi, Takeo ; Toyoshima, Toshiyuki ; Yasuda, Naoki...
Japanese Journal of Applied Physics.  40 (2001)  1R - p. 419 , 2001
Link: https://doi.org/10.1143/..
 
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6

Advanced Micro-Lithography Process for i-line Lithography:

Ishibashi, Takeo ; Toyoshima, Toshiyuki ; Kanda, Takashi...
Japanese Journal of Applied Physics.  40 (2001)  12R - p. 7156 , 2001
Link: https://doi.org/10.1143/..
 
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7

Bottom Anti-Reflective Coatings for DUV Lithography:

Kang, Wen-Bing ; Tanaka, Hatsuyuki ; Kimura, Ken...
Journal of Photopolymer Science and Technology.  10 (1997)  3 - p. 471-477 , 1997
Link: https://doi.org/10.2494/..
 
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