Thayne, I. G.
126  Ergebnisse:
Personensuche X
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2

TEM characterization of GaSb grown on single crystal offcut..:

Porter, H. L. ; Steer, M. J. ; Craven, A. J....
Microscopy and Microanalysis.  23 (2017)  S1 - p. 1476-1477 , 2017
 
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4

A study of the impact of in-situ argon plasma treatment bef..:

Cho, S.J. ; Roberts, J.W. ; Guiney, I....
Microelectronic Engineering.  147 (2015)  - p. 277-280 , 2015
 
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11

Demonstration of a W-band microstrip parallel coupled-line ..:

, In: IET Seminar on Passive RF and Microwave Components,
Lok, L. B. ; Hwang, C.-J. ; Thayne, I. G.. - p. 37-51 , 2010
 
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12

Dry etching device quality high-κ GaxGdyOz gate oxide in Si..:

Li, X. ; Zhou, H. ; Hill, R.J.W....
Microelectronic Engineering.  87 (2010)  5-8 - p. 1587-1589 , 2010
 
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13

Two methods of realising 10 nm T-gate lithography:

Bentley, S. ; Li, X. ; Moran, D.A.J..
Microelectronic Engineering.  86 (2009)  4-6 - p. 1067-1070 , 2009
 
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14

A nanoanalytical investigation of the Ga2O3/GaGdO dielectri..:

Longo, P. ; Paterson, G.W. ; Holland, M.C...
Microelectronic Engineering.  86 (2009)  7-9 - p. 1568-1570 , 2009
 
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15

A nanoanalytical investigation of high-k dielectric gate st..:

Longo, P. ; Craven, A.J. ; Holland, M.C...
Microelectronic Engineering.  86 (2009)  3 - p. 214-217 , 2009
 
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