E-LIB Suche - Ergebnisse für: Toriumi, Minoru

1

Wavelength Dependence of Poly(p-hydroxystyrene) Ablation by..:

Toriumi, Minoru ; Kawasaki, Takayasu ; Araki, Mitsunori..
Journal of Photopolymer Science and Technology. 32 (2019) 2 - p. 189-193 , 2019

Link: https://doi.org/10.2494/..

2

Distributions of hafnia and titania cores in EUV metal resi..:

Toriumi, Minoru ; Sato, Yuta ; Koshino, Masanori..
Applied Physics Express. 9 (2016) 11 - p. 111801 , 2016

Link: https://doi.org/10.7567/..

3

Metal resist for extreme ultraviolet lithography characteri..:

Toriumi, Minoru ; Sato, Yuta ; Koshino, Masanori..
Applied Physics Express. 9 (2016) 3 - p. 031601 , 2016

Link: https://doi.org/10.7567/..

4

Inhomogeneity of photoacid generators in methacrylate-type ..:

Toriumi, Minoru ; Itani, Toshiro
Japanese Journal of Applied Physics. 54 (2015) 6S1 - p. 06FE02 , 2015

Link: https://doi.org/10.7567/..

5

Inhomogeneity of PAGs in Resist Film studied by Molecular D..:

Toriumi, Minoru ; Itani, Toshiro
Journal of Photopolymer Science and Technology. 27 (2014) 5 - p. 617-622 , 2014

Link: https://doi.org/10.2494/..

6

Measurements of binary diffusion coefficients for metal com..:

Toriumi, Minoru ; Katooka, Ryohei ; Yui, Kazuko...
Fluid Phase Equilibria. 297 (2010) 1 - p. 62-66 , 2010

Link: https://doi.org/10.1016/..

7

Feasibility Study of Chemically Amplified Extreme Ultraviol..:

Kozawa, Takahiro ; Tagawa, Seiichi ; Santillan, Julius Joseph..
Japanese Journal of Applied Physics. 47 (2008) 6R - p. 4465 , 2008

Link: https://doi.org/10.1143/..

8

A Study of Molecular Orientation Effect in Photoresist Film:

Kaneyama, Koji ; Toriumi, Minoru ; Itani, Toshiro
Japanese Journal of Applied Physics. 47 (2008) 6S - p. 4936 , 2008

Link: https://doi.org/10.1143/..

9

Reaction Mechanism of Extreme Ultraviolet Resists:

Toriumi, Minoru ; Kaneyama, Koji ; Itani, Toshiro
Japanese Journal of Applied Physics. 47 (2008) 6S - p. 4918 , 2008

Link: https://doi.org/10.1143/..

10

Effects of Rate Constant for Deprotection on Latent Image F..:

Kozawa, Takahiro ; Tagawa, Seiichi ; Santillan, Julius Joseph..
Japanese Journal of Applied Physics. 47 (2008) 6S - p. 4926 , 2008

Link: https://doi.org/10.1143/..

11

Analysis of Outgassing from EUV Resists:

Kobayashi, Shinji ; Toriumi, Minoru ; Santillan, Julious Joseph
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 445-451 , 2007

Link: https://doi.org/10.2494/..

12

Quartz-Crystal-Microbalance Study for Dissolution of Resist..:

Toriumi, Minoru
Journal of Photopolymer Science and Technology. 20 (2007) 4 - p. 585-590 , 2007

Link: https://doi.org/10.2494/..

13

Dissolution behavior of tetrafluoroethylene-based fluoropol..:

Ishikawa, Takuji ; Kodani, Tesuhiro ; Yoshida, Tomohiro...
Journal of Fluorine Chemistry. 125 (2004) 11 - p. 1791-1799 , 2004

Link: https://doi.org/10.1016/..

14

A Nonaqueous Potentiometric Titration Study of the Dissocia..:

Nakatani, Kiyoharu ; Yamashita, Jun ; Sekine, Tomomi..
Analytical Sciences. 19 (2003) 5 - p. 775-777 , 2003

Link: https://doi.org/10.2116/..

15

The Resist Property of Fluoropolymer for 157-nm Lithography:

Ishikawa, Seiichi ; Toriumi, Minoru ; Miyoshi, Seiro...
Journal of Photopolymer Science and Technology. 14 (2001) 4 - p. 595-601 , 2001

Link: https://doi.org/10.2494/..