Torretti, F ;
Liu, F ;
Bayraktar, M...
Torretti , F , Liu , F , Bayraktar , M , Scheers , J , Bouza , Z , Ubachs , W , Hoekstra , R & Versolato , O 2020 , ' Spectral characterization of an industrial EUV light source for nanolithography ' , Journal of Physics D. Applied Physics , vol. 53 , no. 5 , 055204 , pp. 1-7 . https://doi.org/10.1088/1361-6463/ab56d4.
,
2020