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2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) ,
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Advanced TCAD Modeling of HfO2-based ReRAM: Coupling Redox ..:
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2020 IEEE Symposium on VLSI Technology ,
5
Nanosecond Laser Anneal (NLA) for Si-implanted HfO2 Ferroel..:
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2020 IEEE Silicon Nanoelectronics Workshop (SNW) ,
6
Performance assessment of BEOL-integrated HfO2-based ferroe..:
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2017 Symposium on VLSI Technology ,
8