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X
USHIROGOUCHI, Tohru
19  Ergebnisse:
Personensuche X
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1

Nano-stabilized Photo-curable Inkjet Ink for Printing and P..:

Ishibashi, Mitsuru ; Hotta, Yasuyuki ; Ushirogouchi, Tohru...
Journal of Photopolymer Science and Technology.  19 (2006)  5 - p. 653-656 , 2006
Link: https://doi.org/10.2494/..
 
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2

F2 Laser Resist with Fluorinated Polymers:

Naito, Takuya ; Saito, Satoshi ; Shida, Naomi.
Journal of Photopolymer Science and Technology.  15 (2002)  4 - p. 689-692 , 2002
Link: https://doi.org/10.2494/..
 
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3

A new positive electron-beam resist material composed of ca..:

Saito, Satoshi ; Kihara, Naoko ; Ushirogouchi, Tohru
Microelectronic Engineering.  61-62 (2002)  - p. 777-781 , 2002
Link: https://doi.org/10.1016/..
 
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4

Advanced Materials for 193-nm Resists:

Shida, Naomi ; Ushirogouchi, Tohru ; Asakawa, Koji...
Journal of Photopolymer Science and Technology.  13 (2000)  4 - p. 601-606 , 2000
Link: https://doi.org/10.2494/..
 
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5

EB Resist Materials Consist of Catechol Derivatives:

Kihara, Naoko ; Saito, Satoshi ; Ushirogouchi, Tohru.
Journal of Photopolymer Science and Technology.  11 (1998)  4 - p. 553-554 , 1998
Link: https://doi.org/10.2494/..
 
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6

Resists Using the Absorption Band Shift Method for ArF Exci..:

Okino, Takeshi ; Asakawa, Koji ; Shida, Naomi.
Journal of Photopolymer Science and Technology.  11 (1998)  3 - p. 489-492 , 1998
Link: https://doi.org/10.2494/..
 
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7

Study of Copolymer Properties for ArF Excimer Laser Resists:

Asakawa, Koji ; Ushirogouchi, Tohru ; Shida, Naomi..
Journal of Photopolymer Science and Technology.  10 (1997)  4 - p. 559-560 , 1997
Link: https://doi.org/10.2494/..
 
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8

Dissolution Inhibitors for 193-nm Chemically Amplified Resi..:

Ushirogouchi, Tohru ; Asakawa, Koji ; Okino, Takeshi...
Japanese Journal of Applied Physics.  36 (1997)  12S - p. 7625 , 1997
Link: https://doi.org/10.1143/..
 
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9

Inhibition and Promotion Efficiency of Bis-phenol Type Diss..:

Kihara, Naoko ; Saito, Satoshi ; Naito, Takuya...
Journal of Photopolymer Science and Technology.  10 (1997)  3 - p. 417-423 , 1997
Link: https://doi.org/10.2494/..
 
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10

Novel ArF Excimer Laser Resists Based on Menthyl Methacryla..:

SHIDA, Naomi ; USHIROGOUCHI, Tohru ; ASAKAWA, Kohji.
Journal of Photopolymer Science and Technology.  9 (1996)  3 - p. 457-464 , 1996
Link: https://doi.org/10.2494/..
 
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11

Environmentally friendly water-soluble resists via chemical..:

SHIDA, Naomi ; USHIROGOUCHI, Tohru ; NAKASE, Makoto
Journal of Photopolymer Science and Technology.  8 (1995)  1 - p. 173-178 , 1995
Link: https://doi.org/10.2494/..
 
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12

Effect of acid evaporation in chemically amplified resists ..:

KIHARA, NAOKO ; SAITO, SATOSHI ; USHIROGOUCHI, TOHRU.
Journal of Photopolymer Science and Technology.  8 (1995)  4 - p. 561-569 , 1995
Link: https://doi.org/10.2494/..
 
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13

Highly Transparent Chemically Amplified ArF Excimer Laser R..:

Naito, Takuya ; Asakawa, Koji ; Shida, Naomi..
Japanese Journal of Applied Physics.  33 (1994)  12S - p. 7028 , 1994
Link: https://doi.org/10.1143/..
 
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14

Chemically Amplified Resist Using Self‐Solubility Accelerat..:

Kihara, Naoko ; Ushirogouchi, Tohru ; Tada, Tsukasa...
Journal of The Electrochemical Society.  141 (1994)  11 - p. 3162-3166 , 1994
Link: https://doi.org/10.1149/..
 
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15

Molecular Design of Acid Generators for EB and ArF Excimer ..:

Ushirogouchi, Tohru ; Kihara, Naoko ; Saito, Satoshi...
Journal of Photopolymer Science and Technology.  7 (1994)  3 - p. 423-432 , 1994
Link: https://doi.org/10.2494/..
 
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