E-LIB Suche - Ergebnisse für: Van Elshocht, Sven

1

A combinatorial study of SiGeAsTe thin films for applicatio..:

Devulder, Wouter ; Garbin, Daniele ; Clima, Sergiu...
Thin Solid Films. 753 (2022) - p. 139278 , 2022

Link: https://doi.org/10.1016/..

2

Pulsed chemical vapor deposition of conformal GeSe for appl..:

Haider, Ali ; Deng, Shaoren ; Devulder, Wouter...
Materials Advances. 2 (2021) 5 - p. 1635-1643 , 2021

Link: https://doi.org/10.1039/..

3

Structural and Magnetic Properties of Mn3Ge Grown on a Thin..:

Liu, Enlong ; Couet, Sebastien ; Jochum, Johanna K....
physica status solidi (RRL) – Rapid Research Letters. 13 (2019) 6 - p. , 2019

Link: https://doi.org/10.1002/..

4

Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle R..:

Soethoudt, Job ; Grillo, Fabio ; Marques, Esteban A....
Advanced Materials Interfaces. 5 (2018) 24 - p. , 2018

Link: https://doi.org/10.1002/..

5

Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional ..:

Groven, Benjamin ; Heyne, Markus ; Nalin Mehta, Ankit...
Chemistry of Materials. 29 (2017) 7 - p. 2927-2938 , 2017

Link: https://doi.org/10.1021/..

6

Thickness dependence of the resistivity of platinum-group m..:

Dutta, Shibesh ; Sankaran, Kiroubanand ; Moors, Kristof...
Journal of Applied Physics. 122 (2017) 2 - p. , 2017

Link: https://doi.org/10.1063/..

7

Atomic Layer Deposition of Ruthenium Thin Films from (Ethyl..:

Popovici, Mihaela ; Groven, Benjamin ; Marcoen, Kristof...
Chemistry of Materials. 29 (2017) 11 - p. 4654-4666 , 2017

Link: https://doi.org/10.1021/..

8

Sacrificial Self-Assembled Monolayers for the Passivation o..:

Cuypers, Daniel ; Fleischmann, Claudia ; van Dorp, Dennis H....
Chemistry of Materials. 28 (2016) 16 - p. 5689-5701 , 2016

Link: https://doi.org/10.1021/..

9

Phase analysis and thermal stability of thin films synthesi..:

Peter, Antony Premkumar ; Witters, Thomas ; Dutta, Shibesh...
Microelectronic Engineering. 149 (2016) - p. 46-51 , 2016

Link: https://doi.org/10.1016/..

10

Effect of Remote Oxygen Scavenging on Electrical Properties..:

Fadida, Sivan ; Nyns, Laura ; Van Elshocht, Sven.
Journal of Electronic Materials. 46 (2016) 1 - p. 386-392 , 2016

Link: https://doi.org/10.1007/..

11

Low leakage stoichiometric SrTiO3 dielectric for advanced m..:

Popovici, Mihaela ; Kaczer, Ben ; Afanas'ev, Valeri V....
physica status solidi (RRL) – Rapid Research Letters. 10 (2016) 5 - p. 420-425 , 2016

Link: https://doi.org/10.1002/..

12

Atomic Layer Deposition of Ruthenium with TiN Interface for..:

Wen, Liang Gong ; Roussel, Philippe ; Pedreira, Olalla Varela...
ACS Applied Materials & Interfaces. 8 (2016) 39 - p. 26119-26125 , 2016

Link: https://doi.org/10.1021/..

13

Characterization of ultra-thin nickel–silicide films synthe..:

Peter, Antony Premkumar ; Yu, Hao ; Dutta, Shibesh...
Microelectronic Engineering. 157 (2016) - p. 52-59 , 2016

Link: https://doi.org/10.1016/..

14

Graphene oxide monolayers as atomically thin seeding layers..:

Nourbakhsh, Amirhasan ; Adelmann, Christoph ; Song, Yi...
Nanoscale. 7 (2015) 24 - p. 10781-10789 , 2015

Link: https://doi.org/10.1039/..

15

Ozone‐Based Atomic Layer Deposition of Gd2O3 from Tris(isop..:

Han, Jeong Hwan ; Delabie, Annelies ; Franquet, Alexis...
Chemical Vapor Deposition. 21 (2015) 10-11-12 - p. 352-359 , 2015

Link: https://doi.org/10.1002/..