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Van Look, Lieve
8  Ergebnisse:
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1

Mask innovations on the eve of high NA EUV lithography:

Philipsen, Vicky ; Frommhold, Andreas ; Thakare, Devesh...
Japanese Journal of Applied Physics.  63 (2024)  4 - p. 040804 , 2024
Link: https://doi.org/10.35848..
 
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2

High throughput grating qualification of directed self-asse..:

Van Look, Lieve ; Rincon Delgadillo, Paulina ; Lee, Yu-tsung...
Microelectronic Engineering.  123 (2014)  - p. 175-179 , 2014
Link: https://doi.org/10.1016/..
 
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3

High Throughput Grating Qualification for Rating Directed S..:

Gronheid, Roel ; Van Look, Lieve ; Delgadillo, Paulina Rincon...
Journal of Photopolymer Science and Technology.  26 (2013)  2 - p. 147-152 , 2013
Link: https://doi.org/10.2494/..
 
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4

Readying Directed Self-Assembly for Patterning in Semi-Cond..:

Gronheid, Roel ; Delgadillo, Paulina Rincon ; Singh, Arjun...
Journal of Photopolymer Science and Technology.  26 (2013)  6 - p. 779-791 , 2013
Link: https://doi.org/10.2494/..
 
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5

"Mask Enhancer" Technology on ArF Immersion Tool for 45-nm-..:

Yuito, Takashi ; Wiaux, Vincent ; Look, Lieve Van...
Japanese Journal of Applied Physics.  45 (2006)  6S - p. 5396 , 2006
Link: https://doi.org/10.1143/..
 
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6

Pinning of domain walls and flux lines in a nanostructured ..:

Raedts, Sophie ; Van Bael, Margriet J ; Temst, Kristiaan...
Physica C: Superconductivity.  369 (2002)  1-4 - p. 258-261 , 2002
Link: https://doi.org/10.1016/..
 
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7

Flux pinning by regular arrays of ferromagnetic dots:

Van Bael, Margriet J. ; Van Look, Lieve ; Temst, Kristiaan...
Physica C: Superconductivity.  332 (2000)  1-4 - p. 12-19 , 2000
Link: https://doi.org/10.1016/..
 
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8

Nucleation of superconductivity in a mesoscopic loop of fin..:

Bruyndoncx, Vital ; Van Look, Lieve ; Moshchalkov, Victor V
Physica C: Superconductivity.  332 (2000)  1-4 - p. 417-421 , 2000
Link: https://doi.org/10.1016/..
 
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