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X
Volkos, S. N.
19  Ergebnisse:
Personensuche X
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1

O3-based atomic layer deposition of hexagonal La2O3 films o..:

Lamagna, L. ; Wiemer, C. ; Perego, M....
Journal of Applied Physics.  108 (2010)  8 - p. , 2010
Link: https://doi.org/10.1063/..
 
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2

Erratum to "Infrared spectroscopy and X-ray diffraction stu..:

Tsoutsou, D. ; Scarel, G. ; Debernardi, A....
Microelectronic Engineering.  86 (2009)  10 - p. 2138 , 2009
Link: https://doi.org/10.1016/..
 
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3

Atomic layer deposition of LaxZr1−xO2−δ (x=0.25) high-k die..:

Tsoutsou, D. ; Lamagna, L. ; Volkos, S. N....
Applied Physics Letters.  94 (2009)  5 - p. , 2009
Link: https://doi.org/10.1063/..
 
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4

Infrared spectroscopy and X-ray diffraction studies on the ..:

Tsoutsou, D. ; Scarel, G. ; Debernardi, A....
Microelectronic Engineering.  85 (2008)  12 - p. 2411-2413 , 2008
Link: https://doi.org/10.1016/..
 
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5

Reliability degradation of thin HfO2/SiO2 gate stacks by re..:

Efthymiou, E. ; Bernardini, S. ; Zhang, J.F....
Thin Solid Films.  517 (2008)  1 - p. 207-208 , 2008
Link: https://doi.org/10.1016/..
 
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6

Nanoscale electrical characterization of ultrathin high-k d..:

Uppal, H.J. ; Bernardini, S. ; Efthymiou, E....
Materials Science in Semiconductor Processing.  11 (2008)  5-6 - p. 250-253 , 2008
Link: https://doi.org/10.1016/..
 
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7

Germanium-induced stabilization of a very high-k zirconia p..:

Tsipas, P. ; Volkos, S. N. ; Sotiropoulos, A....
Applied Physics Letters.  93 (2008)  8 - p. , 2008
Link: https://doi.org/10.1063/..
 
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8

Reliability nano-characterization of thin SiO2 and HfSixOy/..:

Efthymiou, E. ; Bernardini, S. ; Volkos, S.N....
Microelectronic Engineering.  84 (2007)  9-10 - p. 2290-2293 , 2007
Link: https://doi.org/10.1016/..
 
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9

Vibrational and electrical properties of hexagonal La2O3 fi..:

Scarel, G. ; Debernardi, A. ; Tsoutsou, D....
Applied Physics Letters.  91 (2007)  10 - p. , 2007
Link: https://doi.org/10.1063/..
 
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10

Extrinsic stacking fault generation related to high–k diele..:

Volkos, S.N. ; Bernardini, S. ; Rigopoulos, N....
Microelectronic Engineering.  84 (2007)  9-10 - p. 2374-2377 , 2007
Link: https://doi.org/10.1016/..
 
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11

Erratum: "Vibrational and electrical properties of hexagona..:

Scarel, G. ; Debernardi, A. ; Tsoutsou, D....
Applied Physics Letters.  91 (2007)  18 - p. , 2007
Link: https://doi.org/10.1063/..
 
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12

The impact of negative-bias-temperature-instability on the ..:

Volkos, S. N. ; Efthymiou, E. S. ; Bernardini, S....
Journal of Applied Physics.  100 (2006)  12 - p. , 2006
Link: https://doi.org/10.1063/..
 
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13

Negative-bias-temperature-instability in metal–insulator–se..:

Volkos, S.N. ; Peaker, A.R. ; Hawkins, I.D...
Materials Science and Engineering: B.  109 (2004)  1-3 - p. 127-130 , 2004
Link: https://doi.org/10.1016/..
 
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14

O-3-based atomic layer deposition of hexagonal La2O3 films ..:

Lamagna, L ; Wiemer, C ; Perego, M...
info:eu-repo/semantics/altIdentifier/doi/10.1063/1.3499258.  , 2010
Link: https://hal.archives-ouv..
 
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15

O-3-based atomic layer deposition of hexagonal La2O3 films ..:

Lamagna, L ; Wiemer, C ; Perego, M...
info:eu-repo/semantics/altIdentifier/doi/10.1063/1.3499258.  , 2010
Link: https://hal.science/hal-..
 
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