E-LIB Suche - Ergebnisse für: Woo, Jong-Chang

1

Surface Polarity Dependent Photo-response of GaN MSM Ultrav..:

Shin, Seung Heon ; Kim, Dong-Seok ; Woo, Jong-Chang...
Transactions on Electrical and Electronic Materials. , 2024

2

Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupl..:

Woo, Jong-Chang ; Kim, Dong-Pyo ; Kim, Gwan-Ha
Transactions on Electrical and Electronic Materials. 23 (2022) 5 - p. 569-577 , 2022

Link: https://doi.org/10.1007/..

3

The Reflectance Characteristics of an Inverse Moth-Eye Stru..:

Woo, Jong-Chang ; Um, Doo-Seung
Micromachines. 13 (2022) 10 - p. 1556 , 2022

Link: https://doi.org/10.3390/..

4

Electrical Properties and Thermal Annealing Effects of Poly..:

Um, Doo-Seung ; Jin, Mi-Jin ; Woo, Jong-Chang...
Crystals. 11 (2021) 4 - p. 351 , 2021

Link: https://doi.org/10.3390/..

5

Microstructural Characteristics of Oxide Layer Growth on Ti..:

Kim, Kyung-Seob ; Woo, Jong-Chang
Transactions on Electrical and Electronic Materials. 20 (2019) 4 - p. 375-382 , 2019

Link: https://doi.org/10.1007/..

6

Correction to: Microstructural Characteristics of Oxide Lay..:

Kim, Kyung-Seob ; Woo, Jong-Chang
Transactions on Electrical and Electronic Materials. 20 (2019) 4 - p. 383-383 , 2019

Link: https://doi.org/10.1007/..

7

Save energy on OLED lighting by a simple yet powerful techn..:

Kim, Joo Yeon ; Joo, Chul Woong ; Lee, Jonghee...
RSC Advances. 5 (2015) 11 - p. 8415-8421 , 2015

Link: https://doi.org/10.1039/..

8

Surface properties of ZrO2thin film under Cl2/Ar plasma usi..:

Woo, Jong-Chang ; Choi, Chang-Auck ; Yang, Woo-Seok..
Japanese Journal of Applied Physics. 53 (2014) 8S3 - p. 08NB05 , 2014

Link: https://doi.org/10.7567/..

9

Etching properties of Na0.5K0.5NbO3 thin films by using ind..:

Joo, Young-Hee ; Woo, Jong-Chang ; Kim, Chang-Il
Microelectronic Engineering. 114 (2014) - p. 1-6 , 2014

Link: https://doi.org/10.1016/..

10

The use of high density plasma system to improve the etch p..:

Woo, Jong-Chang ; Chun, Yoon-Soo ; Kim, Chang-Il
Applied Surface Science. 292 (2014) - p. 915-920 , 2014

Link: https://doi.org/10.1016/..

11

Surface reaction effects on dry etching of IGZO thin films ..:

Joo, Young-Hee ; Woo, Jong-Chang ; Kim, Chang-Il
Microelectronic Engineering. 112 (2013) - p. 74-79 , 2013

Link: https://doi.org/10.1016/..

12

Surface Chemical Reaction on HfO2Thin Film Etched by High D..:

Kang, Pil-Seung ; Woo, Jong-Chang ; Joo, Young-Hee.
Ferroelectrics. 454 (2013) 1 - p. 91-98 , 2013

Link: https://doi.org/10.1080/..

13

Dry etching properties of TiO2 thin films in O2/CF4/Ar plas..:

Choi, Kyung-Rok ; Woo, Jong-Chang ; Joo, Young-Hee..
Vacuum. 92 (2013) - p. 85-89 , 2013

Link: https://doi.org/10.1016/..

14

Dry Etch Properties of ZTO Thin Films Using Inductively Cou..:

Kim, Han-Soo ; Woo, Jong-Chang ; Joo, Young-Hee.
Ferroelectrics. 454 (2013) 1 - p. 99-109 , 2013

Link: https://doi.org/10.1080/..

15

A study of the surface reaction on the etched ITO thin film..:

Kim, Han-Soo ; Woo, Jong-Chang ; Joo, Young-Hee.
Vacuum. 93 (2013) - p. 7-12 , 2013

Link: https://doi.org/10.1016/..