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Yamabe, Masaki
37  Ergebnisse:
Personensuche X
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1

Mapping potential conflicts between global agriculture and ..:

Hoang, Nguyen Tien ; Taherzadeh, Oliver ; Ohashi, Haruka...
Proceedings of the National Academy of Sciences.  120 (2023)  23 - p. , 2023
Link: https://doi.org/10.1073/..
 
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2

Reply to Bawa and Liu: Want sustainable food? Embrace compl..:

Hoang, Nguyen Tien ; Taherzadeh, Oliver ; Ohashi, Haruka...
Proceedings of the National Academy of Sciences.  120 (2023)  48 - p. , 2023
Link: https://doi.org/10.1073/..
 
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3

Photomask Data Prioritization Based on VLSI Design Intent a..:

KATO, Kokoro ; ENDO, Masakazu ; INOUE, Tadao...
IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences.  E93-A (2010)  12 - p. 2424-2432 , 2010
Link: https://doi.org/10.1587/..
 
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4

Influence of Electron Density Distribution at the Electron ..:

Kotera, Masatoshi ; Sakai, Masahiko ; Shimizu, Isao...
Japanese Journal of Applied Physics.  40 (2001)  2R - p. 904 , 2001
Link: https://doi.org/10.1143/..
 
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5

An Improved Electron Scattering Simulation at the Maskin a ..:

Kotera, Masatoshi ; Ishida, Yoshihisa ; Naruse, Kentarou...
Japanese Journal of Applied Physics.  39 (2000)  12S - p. 6861 , 2000
Link: https://doi.org/10.1143/..
 
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6

Amorphous Refractory Compound Film Material for X-Ray Mask ..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Iizuka, Takashi.
Japanese Journal of Applied Physics.  39 (2000)  9R - p. 5329 , 2000
Link: https://doi.org/10.1143/..
 
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7

Characteristic Variation of Exposure Pattern in Cell-Projec..:

Kotera, Masatoshi ; Yamaguchi, Kiyoshi ; Okagawa, Takashi...
Japanese Journal of Applied Physics.  38 (1999)  12S - p. 7031 , 1999
Link: https://doi.org/10.1143/..
 
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8

Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane b..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Aoyama, Hajime..
Japanese Journal of Applied Physics.  37 (1998)  7A - p. L824 , 1998
Link: https://doi.org/10.1143/..
 
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9

Etching Residues of Sputtered Ta Film Using Chlorine-Based ..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Takeda, Masayuki..
Japanese Journal of Applied Physics.  37 (1998)  2B - p. L251 , 1998
Link: https://doi.org/10.1143/..
 
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10

Precise Stress Control of Ta Absorber using Low Stress Alum..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Aoyama, Hajime..
Japanese Journal of Applied Physics.  35 (1996)  12S - p. 6463 , 1996
Link: https://doi.org/10.1143/..
 
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11

Stress stabilization of tantalum absorbers on x-ray masks:

Kondo, Kazuaki ; Nakaishi, Masafumi ; Yamada, Masao..
Microelectronic Engineering.  21 (1993)  1-4 - p. 75-78 , 1993
Link: https://doi.org/10.1016/..
 
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12

Anomalous Etching Residues of Sputter-Deposited Ta upon Rea..:

Nakaishi, Masafumi ; Yamada, Masao ; Kondo, Kazuaki..
Japanese Journal of Applied Physics.  31 (1992)  11B - p. L1625 , 1992
Link: https://doi.org/10.1143/..
 
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13

The Absolute Rate Constants of Reaction of Hydrogen Atoms w..:

Ishikawa, Yo-ichi ; Yamabe, Masaki ; Noda, Akihiko.
Bulletin of the Chemical Society of Japan.  51 (1978)  9 - p. 2488-2492 , 1978
Link: https://doi.org/10.1246/..
 
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14

The Theoretical Estimation of the G-Values for the Ionizati..:

Okazaki, Kiyoshi ; Yamabe, Masaki ; Sato, Shin
Bulletin of the Chemical Society of Japan.  50 (1977)  6 - p. 1409-1415 , 1977
Link: https://doi.org/10.1246/..
 
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15

A SHORT FLASH OF MERCURY RESONANCE LINE AT 253.7 NM:

Sato, Shin ; Okazaki, Kiyoshi ; Yamabe, Masaki...
Chemistry Letters.  5 (1976)  4 - p. 385-388 , 1976
Link: https://doi.org/10.1246/..
 
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