Ich stimme zu, dass diese Seite Cookies verwende. Weitere Informationen finden Sie unter unseren Datenschutzerklärungen .
X
Yamanashi, Hiromasa
22  Ergebnisse:
Personensuche X
?
1

Performance and quality analysis of Mo–Si multilayers forme..:

Hiruma, Kenji ; Miyagaki, Shinji ; Yamanashi, Hiromasa..
Thin Solid Films.  516 (2008)  8 - p. 2050-2057 , 2008
Link: https://doi.org/10.1016/..
 
?
2

Study of Measurement Condition Optimization in Critical Dim..:

Hitomi, Keiichiro ; Nakayama, Yoshinori ; Yamanashi, Hiromasa..
Japanese Journal of Applied Physics.  47 (2008)  8R - p. 6554 , 2008
Link: https://doi.org/10.1143/..
 
?
3

Heat Sink Dependency of Mask In-Plane Displacement for Extr..:

Chiba, Akira ; Sugawara, Minoru ; Yamanashi, Hiromasa.
Japanese Journal of Applied Physics.  42 (2003)  Part 1, No. 6B - p. 3784-3791 , 2003
Link: https://doi.org/10.1143/..
 
?
4

Pattern Printability for Variation in Thickness of a Mo/Si ..:

Sugawara, Minoru ; Chiba, Akira ; Yamanashi, Hiromasa.
Japanese Journal of Applied Physics.  42 (2003)  Part 1, No. 1 - p. 78-85 , 2003
Link: https://doi.org/10.1143/..
 
?
5

Alternating Phase Shift Mask in Extreme Ultra Violet Lithog..:

Sugawara, Minoru ; Chiba, Akira ; Yamanashi, Hiromasa.
Japanese Journal of Applied Physics.  42 (2003)  Part 1, No. 6B - p. 3776-3783 , 2003
Link: https://doi.org/10.1143/..
 
?
6

Attenuated phase-shift mask for line patterns in EUV lithog..:

Sugawara, Minoru ; Chiba, Akira ; Yamanashi, Hiromasa..
Microelectronic Engineering.  67-68 (2003)  - p. 10-16 , 2003
Link: https://doi.org/10.1016/..
 
?
7

Estimation of Mask Placement Error Caused by Multilayer Str..:

Chiba, Akira ; Sugawara, Minoru ; Yamanashi, Hiromasa.
Japanese Journal of Applied Physics.  42 (2003)  Part 1, No. 1 - p. 228-235 , 2003
Link: https://doi.org/10.1143/..
 
?
8

Transmission Electron Microscopy Observation and Simulation..:

Ogawa, Taro ; Ito, Masaaki ; Takahashi, Masashi...
Japanese Journal of Applied Physics.  41 (2002)  Part 1, No. 6A - p. 4031-4031 , 2002
Link: https://doi.org/10.1143/..
 
?
9

Simulation model of EUVL mask temperature rise during scann..:

Chiba, Akira ; Hoshino, Eiichi ; Yamanashi, Hiromasa...
Microelectronic Engineering.  61-62 (2002)  - p. 193-202 , 2002
Link: https://doi.org/10.1016/..
 
?
10

Transmission Electron Microscopy Observation and Simulation..:

Ogawa, Taro ; Ito, Masaaki ; Takahashi, Masashi...
Japanese Journal of Applied Physics.  41 (2002)  Part 1, No. 4A - p. 2285-2288 , 2002
Link: https://doi.org/10.1143/..
 
?
11

Measurement of Temperature Rise of Quartz Plate during Sync..:

Chiba, Akira ; Oizumi, Hiroaki ; Yamanashi, Hiromasa...
Japanese Journal of Applied Physics.  41 (2002)  Part 1, No. 1 - p. 393-398 , 2002
Link: https://doi.org/10.1143/..
 
?
12

Assessment of Heat Deformation and Throughput for Selecting..:

Chiba, Akira ; Sugawara, Minoru ; Yamanashi, Hiromasa.
Japanese Journal of Applied Physics.  41 (2002)  Part 1, No. 11A - p. 6498-6505 , 2002
Link: https://doi.org/10.1143/..
 
?
13

Theoretical Analysis of Placement Error due to Absorber Pat..:

Chiba, Akira ; Takahashi, Masashi ; Yamanashi, Hiromasa...
Japanese Journal of Applied Physics.  40 (2001)  6R - p. 3947 , 2001
Link: https://doi.org/10.1143/..
 
?
14

Evaluation of the Outgassing from Resists at the EUV Wavele..:

Irie, Shigeo ; Oizumi, Hiroaki ; Nishiyama, Iwao...
Journal of Photopolymer Science and Technology.  14 (2001)  4 - p. 561-565 , 2001
Link: https://doi.org/10.2494/..
 
?
15

Approach to Patterning of Extreme Ultraviolet Lithography M..:

Lee, Byoung Taek ; Hoshino, Eiichi ; Takahashi, Masashi...
Japanese Journal of Applied Physics.  40 (2001)  12R - p. 6998 , 2001
Link: https://doi.org/10.1143/..
 
1-15