E-LIB Suche - Ergebnisse für: Yang, Beichao

1

Modeling and Optimal Design of Inductor-Integrated Three-Ph..:

Yang, Beichao ; Wang, Ruitian ; Xiao, Fei...
IEEE Transactions on Power Electronics. 38 (2023) 5 - p. 6196-6211 , 2023

Link: https://doi.org/10.1109/..

2

Modeling and Design of High-Power Enhanced Leakage-Inductan..:

Zhang, Xinsheng ; Xiao, Fei ; Wang, Ruitian..
Energies. 15 (2022) 4 - p. 1361 , 2022

Link: https://doi.org/10.3390/..

3

Design of highly compact short‐time duty power inductors fo..:

Zhang, Xinsheng ; Wang, Ruitian ; Xiao, Fei...
IET Power Electronics. 13 (2020) 18 - p. 4377-4385 , 2020

Link: https://doi.org/10.1049/..

4

Design of an Inductor-Integrated Transformer Applied to Inv..:

, In: 2020 IEEE 1st China International Youth Conference on Electrical Engineering (CIYCEE),

Zhang, Xinsheng ; Wang, Ruitian ; Xiao, Fei... - p. 1-7 , 2020

Link: https://doi.org/10.1109/..

5

Modeling and Design of High-Power Enhanced Leakage-Inductan..:

Xinsheng Zhang ; Fei Xiao ; Ruitian Wang..
https://dx.doi.org/10.3390/en15041361. , 2022

Link: https://doi.org/10.3390/..

6

Modeling and Design of High-Power Enhanced Leakage-Inductan..:

Xinsheng Zhang ; Fei Xiao ; Ruitian Wang..
https://www.mdpi.com/1996-1073/15/4/1361. , 2022

Link: https://doi.org/10.3390/..

7

Spacecraft attitude maneuver planning with multi–sensor poi..:

Xue, Wenhao ; Wang, Beichao ; Huang, Xuxing...
Advances in Space Research. 72 (2023) 5 - p. 1485-1495 , 2023

Link: https://doi.org/10.1016/..

8

High brightness laser-driven white emitter for Etendue-limi..:

Yang, Yi ; Zhuang, Songlin ; Kai, Beichao
Applied Optics. 56 (2017) 30 - p. 8321 , 2017

Link: https://doi.org/10.1364/..

9

Siconi Process Applications Study for 28nm Technology Node ..:

Tong, Hao ; Zhang, Bin ; Deng, Hao...
ECS Transactions. 60 (2014) 1 - p. 447-451 , 2014

Link: https://doi.org/10.1149/..

10

Process Optimization of Dielectric CVD Film for Patterning ..:

Deng, Hao ; Zhang, Bin ; Xiang, Yang Hui...
ECS Transactions. 52 (2013) 1 - p. 409-413 , 2013

Link: https://doi.org/10.1149/..

11

A High-Quality Spacer Oxide Formation for 28nm Technology N..:

Zhang, Bin ; Xiang, Yang Hui ; Deng, Hao..
ECS Transactions. 44 (2012) 1 - p. 407-410 , 2012

Link: https://doi.org/10.1149/..

12

A Study of SiCN Cap Process Resultant Plasma Induced Damage..:

Zhou, Ming ; Xiang, Yang Hui ; Guo, Shi Bi...
ECS Transactions. 44 (2012) 1 - p. 423-429 , 2012

Link: https://doi.org/10.1149/..

13

Nano-scale gap filling and mechanism of deposit—etch—deposi..:

Ren, Wan-Chun ; Liu, Bo ; Song, Zhi-Tang...
Chinese Physics B. 21 (2012) 11 - p. 115203 , 2012

Link: https://doi.org/10.1088/..

14

Thin Film Challenges in 28nm Technology Node:

Zhang, Beichao ; Zhang, Bin ; Xiao, Haibo...
ECS Transactions. 44 (2012) 1 - p. 391-394 , 2012

Link: https://doi.org/10.1149/..