E-LIB Suche - Ergebnisse für: Yeom, Geun Young

1

Monolithic DNApatite: An Elastic Apatite with Sub‐Nanometer..:

Lee, Jin Woong ; Lee, Byoungsang ; Park, Cheol Hyun...
Advanced Materials. , 2024

Link: https://doi.org/10.1002/..

2

Semi-Metal Edge Contact for Barrier-Free Carrier Transport ..:

Lee, Sungwon ; Wang, Xinbiao ; Shin, Hoseong...
ACS Applied Electronic Materials. , 2024

Link: https://doi.org/10.1021/..

3

Characteristics of clean SiO2 atomic layer etching based on..:

Sung, Da In ; Tak, Hyun Woo ; Kim, Hee Ju..
Applied Surface Science. 670 (2024) - p. 160574 , 2024

Link: https://doi.org/10.1016/..

4

Plasma enhanced atomic layer deposition of silicon nitride ..:

Ji, You Jin ; Kim, Hae In ; Kang, Ji Eun...
Nanotechnology. 35 (2024) 27 - p. 275701 , 2024

Link: https://doi.org/10.1088/..

5

Enhancement of photosensitivity and stability of Sn-12 EUV ..:

Kang, Yeo Kyung ; Kim, Heeju ; Lee, Sun Jin...
Applied Surface Science. 656 (2024) - p. 159564 , 2024

Link: https://doi.org/10.1016/..

6

Plasma atomic layer etching of ruthenium by oxygen adsorpti..:

Kim, Doo San ; Kwon, Hae In ; Jang, Yun Jong...
Applied Surface Science. 670 (2024) - p. 160570 , 2024

Link: https://doi.org/10.1016/..

7

Selective isotropic etching of SiO2 over Si3N4 using NF3/H2..:

Gil, Hong Seong ; Kim, Doo San ; Jang, Yun Jong...
Scientific Reports. 13 (2023) 1 - p. , 2023

Link: https://doi.org/10.1038/..

8

Characterization of SiO2 Plasma Etching with Perfluorocarbo..:

Choi, Minsu ; Lee, Youngseok ; You, Yebin...
Materials. 16 (2023) 16 - p. 5624 , 2023

Link: https://doi.org/10.3390/..

9

Indium tin oxide etch characteristics using CxH2x+2(x=1,2,3..:

Hong, Jong Woo ; Cho, Hyun Min ; Jeong, Yu Gwang...
Materials Science in Semiconductor Processing. 160 (2023) - p. 107395 , 2023

Link: https://doi.org/10.1016/..

10

Effect of various pulse plasma techniques on TiO2 etching f..:

Hong, Jong Woo ; Kim, Yeon Hee ; Kim, Hee Ju...
Vacuum. 212 (2023) - p. 111978 , 2023

Link: https://doi.org/10.1016/..

11

Non-epitaxial single-crystal 2D material growth by geometri..:

Kim, Ki Seok ; Lee, Doyoon ; Chang, Celesta S....
Nature. 614 (2023) 7946 - p. 88-94 , 2023

Link: https://doi.org/10.1038/..

12

Etched characteristics of nanoscale TiO2 using C4F8-based a..:

Hong, Jong Woo ; Kim, Yeon Hee ; Kim, Hee Ju...
Materials Science in Semiconductor Processing. 164 (2023) - p. 107617 , 2023

Link: https://doi.org/10.1016/..

13

Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscal..:

Kim, Hee Ju ; Yeom, Geun Young
ACS Applied Nano Materials. 6 (2023) 12 - p. 10097-10105 , 2023

Link: https://doi.org/10.1021/..

14

High-throughput manufacturing of epitaxial membranes from a..:

Kim, Hyunseok ; Liu, Yunpeng ; Lu, Kuangye...
Nature Nanotechnology. 18 (2023) 5 - p. 464-470 , 2023

Link: https://doi.org/10.1038/..

15

Surface hardening of extreme ultraviolet(EUV) photoresist b..:

Chang, Won Jun ; Kim, Hee Ju ; Yeom, Geun Young
Applied Surface Science. 629 (2023) - p. 157439 , 2023

Link: https://doi.org/10.1016/..