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An, Cheol Hyun
8686
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1
Optimized Al-doped TiO2 gate insulator for a metal-oxide-se..:
Kim, Dong Gun
;
An, Cheol Hyun
;
Kim, Sang Hyeon
...
Journal of Materials Chemistry C. 9 (2021) 5 - p. 1572-1583 , 2021
Link:
https://doi.org/10.1039/..
?
2
Atomic layer deposition of Ru thin films using (2,4-dimethy..:
Kwon, Dae Seon
;
An, Cheol Hyun
;
Kim, Sang Hyeon
...
Journal of Materials Chemistry C. 8 (2020) 21 - p. 6993-7004 , 2020
Link:
https://doi.org/10.1039/..
?
3
Novel Selector‐Induced Current‐Limiting Effect through Asym..:
Kim, Yumin
;
Kwon, Young Jae
;
Kim, Jihun
...
Advanced Electronic Materials. 5 (2019) 7 - p. , 2019
Link:
https://doi.org/10.1002/..
?
4
Substrate Effects on the Growth Behavior of Atomic-Layer-De..:
An, Cheol Hyun
;
Jeon, Woojin
;
Kim, Sang Hyeon
...
The Journal of Physical Chemistry C. 123 (2019) 36 - p. 22539-22549 , 2019
Link:
https://doi.org/10.1021/..
?
5
Leakage Current Control of SrTiO3 Thin Films through Al Dop..:
Kim, Sang Hyeon
;
Lee, Woongkyu
;
An, Cheol Hyun
...
physica status solidi (RRL) – Rapid Research Letters. 13 (2019) 11 - p. , 2019
Link:
https://doi.org/10.1002/..
?
6
Scaling the Equivalent Oxide Thickness by Employing a TiO2 ..:
Cha, Soon Hyung
;
An, Cheol Hyun
;
Cho, Seong Tak
...
physica status solidi (RRL) – Rapid Research Letters. 13 (2019) 10 - p. , 2019
Link:
https://doi.org/10.1002/..
?
7
Effect of the Annealing Temperature of the Seed Layer on th..:
Kim, Sang Hyeon
;
Lee, Woongkyu
;
An, Cheol Hyun
...
physica status solidi (RRL) – Rapid Research Letters. 13 (2019) 5 - p. , 2019
Link:
https://doi.org/10.1002/..
?
8
Quantitative Analysis of the Incorporation Behaviors of Sr ..:
Chung, Min Jung
;
Jeon, Woojin
;
An, Cheol Hyun
...
ACS Applied Materials & Interfaces. 10 (2018) 10 - p. 8836-8844 , 2018
Link:
https://doi.org/10.1021/..
?
9
2D Electron Gas at the Interface of Atomic‐Layer‐Deposited ..:
Lee, Hyun Jae
;
Moon, Taehwan
;
An, Cheol Hyun
.
Advanced Electronic Materials. 5 (2018) 1 - p. , 2018
Link:
https://doi.org/10.1002/..
?
10
Effect of Growth Temperature during the Atomic Layer Deposi..:
Kim, Sang Hyeon
;
Lee, Woongkyu
;
An, Cheol Hyun
...
ACS Applied Materials & Interfaces. 10 (2018) 48 - p. 41544-41551 , 2018
Link:
https://doi.org/10.1021/..
?
11
Controlling the Electrical Characteristics of ZrO2/Al2O3/Zr..:
An, Cheol Hyun
;
Lee, Woongkyu
;
Kim, Sang Hyeon
...
physica status solidi (RRL) – Rapid Research Letters. 13 (2018) 3 - p. , 2018
Link:
https://doi.org/10.1002/..
?
12
Demonstrating the Ultrathin Metal–Insulator– Metal Diode Us..:
Jeon, Woojin
;
Kim, Youngjin
;
An, Cheol Hyun
...
IEEE Transactions on Electron Devices. 65 (2018) 2 - p. 660-666 , 2018
Link:
https://doi.org/10.1109/..
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13
Electrical Properties of ZrO2/Al2O3/ZrO2‐Based Capacitors w..:
Lee, Woongkyu
;
An, Cheol Hyun
;
Yoo, Sijung
...
physica status solidi (RRL) – Rapid Research Letters. 12 (2018) 10 - p. , 2018
Link:
https://doi.org/10.1002/..
?
14
Balancing the Source and Sink of Oxygen Vacancies for the R..:
Park, Tae Hyung
;
Kwon, Young Jae
;
Kim, Hae Jin
...
ACS Applied Materials & Interfaces. 10 (2018) 25 - p. 21445-21450 , 2018
Link:
https://doi.org/10.1021/..
?
15
Ta-Doped SnO2 as a reduction–resistant oxide electrode for ..:
Cho, Cheol Jin
;
Noh, Myoung-Sub
;
Lee, Woo Chul
...
Journal of Materials Chemistry C. 5 (2017) 36 - p. 9405-9411 , 2017
Link:
https://doi.org/10.1039/..
1-15