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Pfitzner, Lothar
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1

Nanoelectronics Research Gaps and Recommendations: A Report..:

Galatsis, Kosmas ; Gargini, Paolo ; Hiramoto, Toshiro...
IEEE Technology and Society Magazine.  34 (2015)  2 - p. 21-30 , 2015
Link: https://doi.org/10.1109/..
 
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2

Metrology, Analysis and Characterization in Micro- and Nano..:

Pfitzner, Lothar ; Nutsch, Andreas ; Oechsner, Richard...
ECS Transactions.  10 (2007)  1 - p. 35-49 , 2007
Link: https://doi.org/10.1149/..
 
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3

Trends in European R&D - Advanced Process Control Down to A..:

Pfitzner, Lothar ; Schellenberger, M. ; Oechsner, R...
ECS Transactions.  2 (2006)  2 - p. 33-54 , 2006
Link: https://doi.org/10.1149/..
 
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4

A roadmap towards cost efficient 300mm equipment:

Pfitzner, Lothar ; Kücher, Peter
Materials Science in Semiconductor Processing.  5 (2002)  4-5 - p. 321-331 , 2002
Link: https://doi.org/10.1016/..
 
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5

From overall equipment efficiency (OEE) to overall Fab effe..:

Oechsner, Richard ; Pfeffer, Markus ; Pfitzner, Lothar...
Materials Science in Semiconductor Processing.  5 (2002)  4-5 - p. 333-339 , 2002
Link: https://doi.org/10.1016/..
 
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6

Cost reduction strategies for wafer expenditure:

Pfitzner, Lothar ; Benesch, Norbert ; Öchsner, Richard...
Microelectronic Engineering.  56 (2001)  1-2 - p. 61-71 , 2001
Link: https://doi.org/10.1016/..
 
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7

Novel process control strategies for 300 mm semiconductor p..:

Pfitzner, Lothar ; Oechsner, Richard ; Schneider, Claus...
Microelectronic Engineering.  45 (1999)  2-3 - p. 247-256 , 1999
Link: https://doi.org/10.1016/..
 
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8

Process Optimization by Means of Integrated Monitoring Tool..:

Pfitzner, Lothar H. ; Nutsch, Andreas ; Roeder, Georg.
ECS Transactions.  11 (2007)  3 - p. 3-21 , 2007
Link: https://doi.org/10.1149/..
 
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