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Alemy, Eric
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1

A Novel Resist Freeze Process for Double Imaging:

Abdallah, David J. ; Alemy, Eric ; Chakrapani, Srinivasan..
Journal of Photopolymer Science and Technology.  21 (2008)  5 - p. 655-663 , 2008
Link: https://doi.org/10.2494/..
 
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2

Optimization of 193 nm Contact Hole Resists for 100 nm Node:

Kudo, Takanori ; Alemy, Eric L. ; Dammel, Ralph R....
Journal of Photopolymer Science and Technology.  15 (2002)  4 - p. 549-558 , 2002
Link: https://doi.org/10.2494/..
 
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3

Etch Properties of 193nm Resists: Issues and Approaches:

Padmanaban, Munirathna ; Alemy, Eric ; Dammel, Ralph...
Journal of Photopolymer Science and Technology.  15 (2002)  3 - p. 521-527 , 2002
Link: https://doi.org/10.2494/..
 
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4

Mechanistic Studies on the CD Degradation of 193nm Resists ..:

Kudo, Takanori ; Dammel, Ralph R. ; Bae, Jun-Born...
Journal of Photopolymer Science and Technology.  14 (2001)  3 - p. 407-417 , 2001
Link: https://doi.org/10.2494/..
 
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5

Materials and Resists for 193 and 157nm Applications:

Padmanaban, Munirathna ; Alemy, Eric ; Bae, Jun-Bom...
Journal of Photopolymer Science and Technology.  14 (2001)  4 - p. 631-642 , 2001
Link: https://doi.org/10.2494/..
 
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