Arts, Karsten
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2

Foundations of atomic-level plasma processing in nanoelectr..:

Arts, Karsten ; Hamaguchi, Satoshi ; Ito, Tomoko...
Plasma Sources Science and Technology.  31 (2022)  10 - p. 103002 , 2022
 
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3

Conformality of atomic layer deposition in microchannels: i..:

Yim, Jihong ; Verkama, Emma ; Velasco, Jorge A...
Physical Chemistry Chemical Physics.  24 (2022)  15 - p. 8645-8660 , 2022
 
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6

Oxygen Recombination Probability Data for Plasma-Assisted A..:

Arts, Karsten ; Deijkers, Sanne ; Puurunen, Riikka L...
The Journal of Physical Chemistry C.  125 (2021)  15 - p. 8244-8252 , 2021
 
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7

Plasma-Assisted ALD of Highly Conductive HfNx: On the Effec..:

Karwal, Saurabh ; Verheijen, Marcel A. ; Arts, Karsten...
Plasma Chemistry and Plasma Processing.  40 (2020)  3 - p. 697-712 , 2020
 
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8

Correction to "Film Conformality and Extracted Recombinatio..:

Arts, Karsten ; Utriainen, Mikko ; Puurunen, Riikka L...
The Journal of Physical Chemistry C.  124 (2019)  1 - p. 1250-1250 , 2019
 
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9

Film Conformality and Extracted Recombination Probabilities..:

Arts, Karsten ; Utriainen, Mikko ; Puurunen, Riikka L...
The Journal of Physical Chemistry C.  123 (2019)  44 - p. 27030-27035 , 2019
 
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15

Impact of Ions on Film Conformality and Crystallinity durin..:

Arts, Karsten ; Thepass, Harvey ; Verheijen, Marcel A...
Arts , K , Thepass , H , Verheijen , M A , Puurunen , R L , Kessels , W M M & Knoops , H C M 2021 , ' Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 ' , Chemistry of Materials , vol. 33 , no. 13 , pp. 5002-5009 . https://doi.org/10.1021/acs.chemmater.1c00781.  , 2021
 
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