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Böscke, Tim S
16
results:
Search for persons
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Online (16)
Mediatypes
Articles (Online) (14)
Bookchapter (Online) (1)
OpenAccess-fulltext (1)
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english (14)
german (1)
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?
1
Ferroelectricity in Simple Binary ZrO2 and HfO2:
Müller, Johannes
;
Böscke, Tim S.
;
Schröder, Uwe
...
Nano Letters. 12 (2012) 8 - p. 4318-4323 , 2012
Link:
https://doi.org/10.1021/..
?
2
Stabilization of higher-k tetragonal HfO/sub 2/ by SiO/sub ..:
Böscke, Tim S
;
Govindarajan, Shrinivas
;
Kirsch, Paul D
...
Applied physics letters. Vol. 91, no. 7 (Aug. 2007), 072902, 3 p.. , 2007
Link:
http://hdl.handle.net/10..
?
3
Bifacial n-type cells with >20% front-side efficiency for i..:
, In:
2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) PART 2
,
Boscke, T. S.
;
Kania, D.
;
Helbig, A.
... - p. 1-4 , 2012
Link:
https://doi.org/10.1109/..
?
4
Ferroelectricity in yttrium-doped hafnium oxide:
Müller, J.
;
Schröder, U.
;
Böscke, T. S.
...
Journal of Applied Physics. 110 (2011) 11 - p. , 2011
Link:
https://doi.org/10.1063/..
?
5
Ferroelectric Zr0.5Hf0.5O2 thin films for nonvolatile memor..:
Müller, J.
;
Böscke, T. S.
;
Bräuhaus, D.
...
Applied Physics Letters. 99 (2011) 11 - p. , 2011
Link:
https://doi.org/10.1063/..
?
6
Phase transitions in ferroelectric silicon doped hafnium ox..:
Böscke, T. S.
;
Teichert, St.
;
Bräuhaus, D.
...
Applied Physics Letters. 99 (2011) 11 - p. , 2011
Link:
https://doi.org/10.1063/..
?
7
Ferroelectricity in hafnium oxide thin films:
Böscke, T. S.
;
Müller, J.
;
Bräuhaus, D.
..
Applied Physics Letters. 99 (2011) 10 - p. , 2011
Link:
https://doi.org/10.1063/..
?
8
Improved manufacturability of ZrO2 MIM capacitors by proces..:
Müller, J.
;
Böscke, T.S.
;
Schröder, U.
...
Microelectronic Engineering. 86 (2009) 7-9 - p. 1818-1821 , 2009
Link:
https://doi.org/10.1016/..
?
9
Increasing permittivity in HfZrO thin films by surface mani..:
Böscke, T. S.
;
Hung, P. Y.
;
Kirsch, P. D.
..
Applied Physics Letters. 95 (2009) 5 - p. , 2009
Link:
https://doi.org/10.1063/..
?
10
Dipole model explaining high-k/metal gate field effect tran..:
Kirsch, P. D.
;
Sivasubramani, P.
;
Huang, J.
...
Applied Physics Letters. 92 (2008) 9 - p. , 2008
Link:
https://doi.org/10.1063/..
?
11
Stabilization of higher-κ tetragonal HfO2 by SiO2 admixture..:
Böscke, T. S.
;
Govindarajan, S.
;
Kirsch, P. D.
...
Applied Physics Letters. 91 (2007) 7 - p. , 2007
Link:
https://doi.org/10.1063/..
?
12
Higher permittivity rare earth doped HfO2 for sub-45-nm met..:
Govindarajan, S.
;
Böscke, T. S.
;
Sivasubramani, P.
...
Applied Physics Letters. 91 (2007) 6 - p. , 2007
Link:
https://doi.org/10.1063/..
?
13
Improving screen printed metallization for large area indus..:
Edler, Alexander
;
Mihailetchi, Valentin
;
Kopecek, Radovan
...
Energy Procedia. 8 (2011) - p. 493-497 , 2011
Link:
https://doi.org/10.1016/..
?
14
The Application of X-ray Metrology for Rapid Development of..:
Hung, Pui Yee
;
Böscke, Tim
;
Wormington, Matthew
...
ECS Transactions. 16 (2008) 5 - p. 149-152 , 2008
Link:
https://doi.org/10.1149/..
?
15
Decision-making in the treatment of chronic rhinosinusitis ..:
Hoffmann, Anna S.
;
Betz, Christian S.
;
Böscke, Robert
.
HNO. 72 (2024) 4 - p. 225-230 , 2024
Link:
https://doi.org/10.1007/..
1-15