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Bouteville, Anne
29  results:
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1

Improvement of temperature homogeneity of a silicon wafer h..:

Logerais, Pierre-Olivier ; Riou, Olivier ; Delaleux, Fabien..
Applied Thermal Engineering.  77 (2015)  - p. 76-89 , 2015
Link: https://doi.org/10.1016/..
 
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2

Influence of the Window Thermal Diffusivity on the Silicon ..:

Logerais, Pierre-Olivier ; Khelalfa, Raouf ; Riou, Olivier..
Heat Transfer Engineering.  36 (2015)  13 - p. 1111-1121 , 2015
Link: https://doi.org/10.1080/..
 
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3

Thermal study of an aluminium nitride ceramic heater for sp..:

Riou, Olivier ; Logerais, Pierre-Olivier ; Froger, Vincent..
Quantitative InfraRed Thermography Journal.  10 (2013)  2 - p. 159-171 , 2013
Link: https://doi.org/10.1080/..
 
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4

Influence of the Heating Mode and the Spray Introduction on..:

Garnier, Jérôme ; Sreekumar, Rajappan Achary ; Bouteville, Anne
ECS Transactions.  25 (2009)  8 - p. 1259-1265 , 2009
Link: https://doi.org/10.1149/..
 
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5

A comparison of different spray chemical vapour deposition ..:

Garnier, Jérôme ; Bouteville, Anne ; Hamilton, Jeff..
Thin Solid Films.  518 (2009)  4 - p. 1129-1135 , 2009
Link: https://doi.org/10.1016/..
 
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6

Influence of the window thermal diffusivity on the silicon ..:

Logerais, Pierre-Olivier ; Khelalfa, Raouf ; Riou, Olivier..
hal-02445991.  , 2015
Link: https://hal.science/hal-..
 
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7

Influence of the window thermal diffusivity on the silicon ..:

LOGERAIS, Pierre-Olivier ; KHELALFA, Raouf ; RIOU, Olivier..
0145-7632.  , 2015
Link: http://hdl.handle.net/10..
 
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8

Improvement of temperature homogeneity of a silicon wafer h..:

Logerais, Pierre-Olivier ; Riou, Olivier ; Delaleux, Fabien..
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.applthermaleng.2014.12.013.  , 2015
Link: https://hal.science/hal-..
 
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9

Improvement of temperature homogeneity of a silicon wafer h..:

LOGERAIS, Pierre-Olivier ; RIOU, Olivier ; DELALEUX, Fabien..
1359-4311.  , 2015
Link: http://hdl.handle.net/10..
 
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10

Influence of the window thermal diffusivity on the silicon ..:

Logerais, Pierre-Olivier ; KHELALFA, Raouf ; Riou, Olivier..
hal-02445991.  , 2015
Link: https://hal.archives-ouv..
 
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11

Influence of the window thermal diffusivity on the silicon ..:

Logerais, Pierre-Olivier ; Khelalfa, Raouf ; Riou, Olivier..
hal-02445991.  , 2015
Link: https://hal.science/hal-..
 
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12

Improvement of temperature homogeneity of a silicon wafer h..:

Logerais, Pierre-Olivier ; Riou, Olivier ; Delaleux, Fabien..
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.applthermaleng.2014.12.013.  , 2015
Link: https://hal.science/hal-..
 
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13

Improvement of temperature homogeneity of a silicon wafer h..:

Logerais, Pierre-Olivier ; Riou, Olivier ; Delaleux, Fabien..
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.applthermaleng.2014.12.013.  , 2015
Link: https://hal.archives-ouv..
 
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14

Zn1-xMgxO thin films deposited by original Infrared assiste..:

FROGER, Vincent ; DABOS-SEIGNON, Sylvie ; NOËL, Sophie..
http://hdl.handle.net/10985/10282.  , 2014
Link: http://hdl.handle.net/10..
 
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15

Thermal study of an aluminium nitride ceramic heater for sp..:

Riou, Olivier ; Logerais, Pierre-Olivier ; Froger, Vincent..
info:eu-repo/semantics/altIdentifier/doi/10.1080/17686733.2013.793468.  , 2013
Link: https://hal.science/hal-..
 
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