E-LIB Suche - Ergebnisse für: Byers, Jeffrey D

1

Re: An unusual migratory polycyclic eruption after administ..:

Wheless, Lee ; Murray, Laura E. ; Siddiqui, Fariha.
JAAD Case Reports. 3 (2017) 4 - p. 342-343 , 2017

2

Double Exposure Materials: Simulation Study of Feasibility:

Byers, Jeffrey ; Lee, Saul ; Jen, Kane...
Journal of Photopolymer Science and Technology. 20 (2007) 5 - p. 707-717 , 2007

Link: https://doi.org/10.2494/..

3

Chain Dynamics in Linear and Hyperbranched Phenol−Polycarbo..:

Bolton, Daniel H. ; Goetz, Jon M. ; Gan, Daoji...
Macromolecules. 36 (2003) 7 - p. 2368-2373 , 2003

Link: https://doi.org/10.1021/..

4

Automatic calibration of lithography simulation parameters ..:

Byers, Jeffrey ; Mack, Chris ; Huang, Richard.
Microelectronic Engineering. 61-62 (2002) - p. 89-95 , 2002

Link: https://doi.org/10.1016/..

5

Microlithographic Assessment of a Novel Family of Transpare..:

Klopp, John M. ; Pasini, Dario ; Byers, Jeffrey D...
Chemistry of Materials. 13 (2001) 11 - p. 4147-4153 , 2001

Link: https://doi.org/10.1021/..

6

Sensitized Transparent Photobase Additive For 193 nm Lithog..:

Padmanaban, Munirathna ; Bae, Jun-Born ; Cook, Michelle...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 617-624 , 2000

Link: https://doi.org/10.2494/..

7

157 nm Resist Materials: A Progress Report:

Chiba, Takashi ; Hung, Raymond J. ; Yamada, Shintaro...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 657-664 , 2000

Link: https://doi.org/10.2494/..

8

Improvement of Post-Exposure Delay Stability in Alicyclic A..:

Yamachika, Mikio ; Patterson, Kyle ; Cho, Sungseo...
Journal of Photopolymer Science and Technology. 12 (1999) 4 - p. 553-560 , 1999

Link: https://doi.org/10.2494/..

9

Design of Photoresists with Reduced Environmental Impact. 1..:

Havard, Jennifer M. ; Shim, Sang-Yeon ; Fréchet, Jean M. J....
Chemistry of Materials. 11 (1999) 3 - p. 719-725 , 1999

Link: https://doi.org/10.1021/..

10

Recent Advancements In Cycloolefin Based Resists For ArF Li..:

Byers, Jeffrey ; Patterson, Kyle ; Cho, Sungseo..
Journal of Photopolymer Science and Technology. 11 (1998) 3 - p. 465-474 , 1998

Link: https://doi.org/10.2494/..

11

Photoresists with Reduced Environmental Impact: Water-Solu..:

Havard, Jennifer M. ; Vladimirov, Nikolay ; Fréchet, Jean M. J....
Macromolecules. 32 (1998) 1 - p. 86-94 , 1998

Link: https://doi.org/10.1021/..

12

Alicyclic Polymers for 193 nm Resist Applications: Synthes..:

Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu ; Byers, Jeffrey.
Chemistry of Materials. 10 (1998) 11 - p. 3319-3327 , 1998

Link: https://doi.org/10.1021/..

13

Alicyclic Polymers for 193 nm Resist Applications: Lithogr..:

Okoroanyanwu, Uzodinma ; Byers, Jeffrey ; Shimokawa, Tsutomu.
Chemistry of Materials. 10 (1998) 11 - p. 3328-3333 , 1998

Link: https://doi.org/10.1021/..

14

Pd(II)-catalyzed addition polymerization and ring opening m..:

Okoroanyanwu, Uzodinma ; Shimokawa, Tsutomu ; Byers, Jeffrey D.
Journal of Molecular Catalysis A: Chemical. 133 (1998) 1-2 - p. 93-114 , 1998

Link: https://doi.org/10.1016/..

15

The formation of acid diffusion wells in acid catalyzed pho..:

Petersen, John S. ; Byers, Jeffrey D. ; Carpio, Ronald A.
Microelectronic Engineering. 35 (1997) 1-4 - p. 169-174 , 1997

Link: https://doi.org/10.1016/..