E-LIB Suche - Ergebnisse für: Dai, Gaoliang

1

A new magnetic enhanced chemical mechanical polishing metho..:

Guo, Jiang ; Qin, Pu ; Li, Qikai...
Journal of Materials Processing Technology. 327 (2024) - p. 118361 , 2024

Link: https://doi.org/10.1016/..

2

Atomic and Close-to-Atomic Scale Manufacturing: The Fundame..:

, In: Lecture Notes in Mechanical Engineering; CIRP Novel Topics in Production Engineering: Volume 1,

Fang, Fengzhou ; Luo, Xichun ; Dai, Gaoliang... - p. 315-360 , 2024

Link: https://doi.org/10.1007/..

3

Validation and reliability of the 3D calibration evaluation..:

Xu, Min ; Hemmleb, Matthias ; Dai, Gaoliang
Measurement Science and Technology. 35 (2024) 9 - p. 095020 , 2024

Link: https://doi.org/10.1088/..

4

Precision of diamond turning sinusoidal structures as measu..:

Hüser, Dorothee ; Meeß, Rudolf ; Dai, Gaoliang...
Surface Topography: Metrology and Properties. 12 (2024) 1 - p. 015014 , 2024

Link: https://doi.org/10.1088/..

5

A New Kind of Atomic Force Microscopy Scan Control Enabled ..:

Degenhardt, Johannes ; Bounaim, Mohammed Wassim ; Deng, Nan..
Nanomanufacturing and Metrology. 7 (2024) 1 - p. , 2024

Link: https://doi.org/10.1007/..

6

A feasibility study towards traceable calibration of size a..:

Dai, Gaoliang ; Degenhardt, Johannes ; Hu, Xiukun...
Measurement Science and Technology. 34 (2023) 5 - p. 055009 , 2023

Link: https://doi.org/10.1088/..

7

Systematische Simulationsmethode zur effizienten Abschätzun..:

Degenhardt, Johannes ; Tutsch, Rainer ; Dai, Gaoliang
tm - Technisches Messen. 90 (2023) s1 - p. 27-32 , 2023

Link: https://doi.org/10.1515/..

8

Bottom-up approach for traceable calibration of tip geometr..:

Dai, Gaoliang ; Hu, Xiukun ; Degenhardt, Johannes
Surface Topography: Metrology and Properties. 10 (2022) 1 - p. 015018 , 2022

Link: https://doi.org/10.1088/..

9

Correction: Comparison of EUV Photomask Metrology Between C..:

Dai, Gaoliang ; Hahm, Kai ; Sebastian, Lipfert.
Nanomanufacturing and Metrology. 5 (2022) 4 - p. 440-440 , 2022

Link: https://doi.org/10.1007/..

10

Correction method for 3D non-linear drift distortions in at..:

Degenhardt, Johannes ; Tutsch, Rainer ; Dai, Gaoliang
Measurement Science and Technology. 34 (2022) 2 - p. 025001 , 2022

Link: https://doi.org/10.1088/..

11

Comparison of EUV Photomask Metrology Between CD-AFM and TE:

Dai, Gaoliang ; Hahm, Kai ; Sebastian, Lipfert.
Nanomanufacturing and Metrology. 5 (2022) 2 - p. 91-100 , 2022

Link: https://doi.org/10.1007/..

12

Correction of Interferometric High-Order Nonlinearity Error..:

Dai, Gaoliang ; Hu, Xiukun
Nanomanufacturing and Metrology. 5 (2022) 4 - p. 412-422 , 2022

Link: https://doi.org/10.1007/..

13

Analysis of Line-Edge Roughness Using EUV Scatterometry:

Fernández Herrero, Analía ; Scholze, Frank ; Dai, Gaoliang.
Nanomanufacturing and Metrology. 5 (2022) 2 - p. 149-158 , 2022

Link: https://doi.org/10.1007/..

14

Foreword to the Special Issue on Atomic and Close-to-Atomic..:

Dai, Gaoliang ; Park, Daesung ; Orji, Ndubuisi George
Nanomanufacturing and Metrology. 5 (2022) 2 - p. 81-82 , 2022

Link: https://doi.org/10.1007/..

15

Quantitative Element‐Sensitive Analysis of Individual Nanoo..:

Wählisch, André ; Unterumsberger, Rainer ; Hönicke, Philipp...
Small. 19 (2022) 9 - p. , 2022

Link: https://doi.org/10.1002/..