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De Simone, Danilo
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1

Extreme Ultraviolet Lithographic Performance and Reaction M..:

Naqvi, Bilal A. ; Enomoto, Satoshi ; Machida, Kohei...
Chemistry of Materials.  , 2024
Link: https://doi.org/10.1021/..
 
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2

Reaction mechanisms of Sn-complex-side-chain polymer used f..:

Takata, Yui ; Muroya, Yusa ; Kozawa, Takahiro...
Japanese Journal of Applied Physics.  62 (2023)  7 - p. 076502 , 2023
Link: https://doi.org/10.35848..
 
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3

e-beam metrology of thin resist for high NA EUVL:

Lorusso, Gian Francesco ; De Simone, Danilo ; Zidan, Mohamed...
Japanese Journal of Applied Physics.  62 (2023)  SG - p. SG0808 , 2023
Link: https://doi.org/10.35848..
 
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4

Mean Free Path of Electrons in Organic Photoresists for Ext..:

Fallica, Roberto ; Mahne, Nicola ; Conard, Thierry...
ACS Applied Materials & Interfaces.  15 (2023)  29 - p. 35483-35494 , 2023
Link: https://doi.org/10.1021/..
 
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5

Enhancing Performance and Function of Polymethacrylate Extr..:

Nye, Rachel A. ; Van Dongen, Kaat ; De Simone, Danilo...
Chemistry of Materials.  , 2023
Link: https://doi.org/10.1021/..
 
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6

SIMS Analysis of Thin EUV Photoresist Films:

Spampinato, Valentina ; Franquet, Alexis ; De Simone, Danilo...
Analytical Chemistry.  94 (2022)  5 - p. 2408-2415 , 2022
Link: https://doi.org/10.1021/..
 
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7

EUV Metal Oxide Resist Development Technology for Improved ..:

Dinh, Cong Que ; Nagahara, Seiji ; Kuwahara, Yuhei...
Journal of Photopolymer Science and Technology.  35 (2022)  1 - p. 87-93 , 2022
Link: https://doi.org/10.2494/..
 
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8

Extreme Ultraviolet-Printability and Mechanistic Studies of..:

Rathore, Ashish ; Pollentier, Ivan ; Cipriani, Maicol...
ACS Applied Polymer Materials.  3 (2021)  4 - p. 1964-1972 , 2021
Link: https://doi.org/10.1021/..
 
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9

Electron-induced fragmentation mechanisms in organic monome..:

Rathore, Ashish ; Cipriani, Maicol ; Huang, Ching-Chung...
Physical Chemistry Chemical Physics.  23 (2021)  15 - p. 9228-9234 , 2021
Link: https://doi.org/10.1039/..
 
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10

Evolution of Secondary Electrons Emission During EUV Exposu..:

Fallica, Roberto ; Nannarone, Stefano ; Mahne, Nicola...
Journal of Photopolymer Science and Technology.  34 (2021)  1 - p. 99-103 , 2021
Link: https://doi.org/10.2494/..
 
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11

Effect of molecular weight on the EUV-printability of main ..:

Rathore, Ashish ; Pollentier, Ivan ; Singh, Harpreet...
Journal of Materials Chemistry C.  8 (2020)  17 - p. 5958-5966 , 2020
Link: https://doi.org/10.1039/..
 
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12

Correction: Effect of molecular weight on the EUV-printabil..:

Rathore, Ashish ; Pollentier, Ivan ; Singh, Harpreet...
Journal of Materials Chemistry C.  8 (2020)  17 - p. 5967-5967 , 2020
Link: https://doi.org/10.1039/..
 
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13

Dielectric Response Spectroscopy as Means to Investigate In..:

Severi, Joren ; De Simone, Danilo ; De Gendt, Stefan
Polymers.  12 (2020)  12 - p. 2971 , 2020
Link: https://doi.org/10.3390/..
 
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14

Metal Based Materials for EUV Lithography:

Kosma, Vasiliki ; Simone, Danilo De ; Vandenberghe, Geert
Journal of Photopolymer Science and Technology.  32 (2019)  1 - p. 179-183 , 2019
Link: https://doi.org/10.2494/..
 
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15

Photoresist Challenges for Logic and Memory using 0.33NA EU..:

Simone, Danilo De ; Vandenberghe, Geert
Journal of Photopolymer Science and Technology.  32 (2019)  1 - p. 87-91 , 2019
Link: https://doi.org/10.2494/..
 
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