Dean, Kim R.
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1

EUV Resist Outgassing: How Much is Too Much?:

Dean, Kim R. ; Debeaux, Gregory ; Wüest, Andrea.
Journal of Photopolymer Science and Technology.  20 (2007)  3 - p. 393-402 , 2007
 
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2

Molecular Challenges of Immersion and Extreme Ultraviolet (..:

Dean, Kim R. ; Stark, David
Journal of Photopolymer Science and Technology.  19 (2006)  4 - p. 487-499 , 2006
 
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3

The Status of 157nm Lithography Development:

Dean, Kim R. ; Peski, Chris van ; Kim, Hyeong Soo...
Journal of Photopolymer Science and Technology.  14 (2001)  4 - p. 573-581 , 2001
 
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4

Effects of Airborne Molecular Contamination on DUV Photores..:

Dean, Kim R. ; Miller, Daniel A. ; Carpio, Ronald A...
Journal of Photopolymer Science and Technology.  10 (1997)  3 - p. 425-443 , 1997
 
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5

Survey of processing affects on substrate compatibility of ..:

Petersen, John S. ; Fedynyshyn, Theodore H. ; Thackeray, James W....
Journal of Photopolymer Science and Technology.  8 (1995)  4 - p. 571-597 , 1995
 
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