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Economikos, Laertis
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1

Post Cu CMP Cleaning of Polyurethane Pad Debris:

Tseng, Wei-Tsu ; Rill, Elliott ; Backes, Benjamin...
ECS Journal of Solid State Science and Technology.  3 (2013)  1 - p. N3023-N3031 , 2013
Link: https://doi.org/10.1149/..
 
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2

Using CMP Model for 45nm/32nm BEOL Process and Design Evalu..:

Economikos, Laertis ; Bao, Jerry ; Low, Kia..
ECS Transactions.  33 (2010)  10 - p. 3-7 , 2010
Link: https://doi.org/10.1149/..
 
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3

Evaluation of Barrier CMP Slurries and Characterization of ..:

Tseng, Wei-Tsu ; Kioussis, Dimitri ; Manikonda, Shravanthi L....
ECS Transactions.  13 (2008)  2 - p. 293-306 , 2008
Link: https://doi.org/10.1149/..
 
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4

Study of Inhibition Characteristics of Slurry Additives in ..:

Keswani, Manish K. ; Lee, Hyosang ; Babu, Suryadevara...
ECS Transactions.  2 (2006)  2 - p. 515-522 , 2006
Link: https://doi.org/10.1149/..
 
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5

Mechanism and an empirical model of the fixed abrasivepolis..:

Venigalla, Rajasekhar ; Economikos, Laertis ; Babu, S. V.
Journal of Materials Research.  18 (2003)  7 - p. 1659-1667 , 2003
Link: https://doi.org/10.1557/..
 
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6

Toward full-field measurements of instantaneous visualizati..:

Economikos, Laertis ; Shoemaker, Craig ; Russ, Keith..
Experimental Thermal and Fluid Science.  3 (1990)  1 - p. 74-86 , 1990
Link: https://doi.org/10.1016/..
 
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