Füssel, W.
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1

Physica status solidi 

Volume 98, Number 2: December 16  Physica status solidi ; Volume 98, Number 2, A
Afanasev, A. M ; Ahmad, M ; Alexandrova, S... - Reprint 2021 . , [2022]
 
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2

Physica status solidi 

Volume 51, Number 2: February 16  Physica status solidi ; Volume 51, Number 2, A
Akutsu, J ; Albrecht, G ; Alekseevskii, N. E... - Reprint 2021 . , [2022]
 
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3

Annealing effects on the interface and insulator properties..:

Prado, A del ; Andrés, E San ; Mártil, I...
Semiconductor Science and Technology.  19 (2003)  2 - p. 133-141 , 2003
 
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4

Electrical properties of rapid thermally annealed SiNx:H/Si..:

Martínez, F L ; Prado, A del ; Mártil, I...
Semiconductor Science and Technology.  16 (2001)  7 - p. 534-542 , 2001
 
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5

Capture cross sections of defect states at the Si/SiO2 inte..:

Albohn, J. ; Füssel, W. ; Sinh, N. D...
Journal of Applied Physics.  88 (2000)  2 - p. 842-849 , 2000
 
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6

Anodic passivation of SiGe:

Rappich, J ; Füssel, W
Microelectronics Reliability.  40 (2000)  4-5 - p. 825-827 , 2000
 
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8

Two types of traps at the interface characterized by their ..:

Albohn, J. ; Füssel, W. ; Ngo Duong Sinh...
Microelectronic Engineering.  48 (1999)  1-4 - p. 159-162 , 1999
 
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9

Voltage and current loss in semiconductor solar cells from ..:

Sinh, Ngo Duong ; Spieβ, F. ; Kliefoth, K..
Solar Energy Materials and Solar Cells.  48 (1997)  1-4 - p. 43-52 , 1997
 
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10

Defects at the Si/SiO2 interface: Their nature and behaviou..:

Füssel, W. ; Schmidt, M. ; Angermann, H...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment.  377 (1996)  2-3 - p. 177-183 , 1996
 
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11

Density of states and relaxation spectra of etched, H-termi..:

Flietner, H. ; Füssel, W. ; Sinh, N.D..
Applied Surface Science.  104-105 (1996)  - p. 342-348 , 1996
 
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12

Heterojunctions in photovoltaic applications:

Elstner, L. ; Conrad, E. ; Eschrich, H...
physica status solidi (b).  194 (1996)  1 - p. 79-90 , 1996
 
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14

Structural, optical and electrical properties of SIPOS pass..:

Füssel, W. ; Henrion, W. ; Scholz, R.
Microelectronic Engineering.  22 (1993)  1-4 - p. 355-358 , 1993
 
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