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Fujii, Kiyoshi
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1

Investigating the Mechanisms Underlying the Durability and ..:

Fujii, Kiyoshi ; Suzuki, Taro ; Nakamura, Mitsuru...
Agronomy.  13 (2023)  7 - p. 1751 , 2023
Link: https://doi.org/10.3390/..
 
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2

Decoupled Current Vector Control of Dual Three Phase PMSM D..:

Wang, Shen ; Doki, Shinji ; Suzuki, Takashi..
IEEJ Journal of Industry Applications.  11 (2022)  6 - p. 779-789 , 2022
Link: https://doi.org/10.1541/..
 
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3

Discovery of BMS-986235/LAR-1219: A Potent Formyl Peptide R..:

Asahina, Yoshikazu ; Wurtz, Nicholas R. ; Arakawa, Kazuto...
Journal of Medicinal Chemistry.  63 (2020)  17 - p. 9003-9019 , 2020
Link: https://doi.org/10.1021/..
 
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4

Urinary retention occurring one week after spinal anesthesi..:

Fujii, Kiyoshi ; Moriwaki, Katsuyuki ; Torii, Tsuyoshi...
Canadian Journal of Anesthesia/Journal canadien d'anesthésie.  62 (2014)  1 - p. 50-53 , 2014
Link: https://doi.org/10.1007/..
 
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5

Maintained root length density contributes to the waterlogg..:

Hayashi, Tomohito ; Yoshida, Tomofumi ; Fujii, Kiyoshi...
Field Crops Research.  152 (2013)  - p. 27-35 , 2013
Link: https://doi.org/10.1016/..
 
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6

Applicability of 'glume color' controlled by Rg-B1 locus as..:

Fujii, Kiyoshi ; Tsuji, Takako ; Yoshida, Tomofumi..
Breeding Science.  61 (2011)  1 - p. 11-16 , 2011
Link: https://doi.org/10.1270/..
 
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7

A study of 193-nm immersion lithography using novel high re..:

Santillan, Julius ; Otoguro, Akihiko ; Itani, Toshiro...
Microelectronic Engineering.  83 (2006)  4-9 - p. 651-654 , 2006
Link: https://doi.org/10.1016/..
 
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8

Intrinsic Problem Affecting Contact Hole Resolution in Hype..:

Matsuura, Seiji ; Kurose, Eiji ; Fujii, Kiyoshi
Japanese Journal of Applied Physics.  44 (2005)  7S - p. 5489 , 2005
Link: https://doi.org/10.1143/..
 
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9

Dissolution behavior of tetrafluoroethylene-based fluoropol..:

Ishikawa, Takuji ; Kodani, Tesuhiro ; Yoshida, Tomohiro...
Journal of Fluorine Chemistry.  125 (2004)  11 - p. 1791-1799 , 2004
Link: https://doi.org/10.1016/..
 
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10

A New Monocyclic Fluoropolymer for 157-nm Photoresists:

Sasaki, Takashi ; Takebe, Yoko ; eda, Masataka...
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 639-644 , 2004
Link: https://doi.org/10.2494/..
 
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11

Application of a New BARC Material for 157-nm Lithography:

Shigematu, Masato ; Irie, Shigeo ; Sakamoto, Rikimaru...
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 665-670 , 2004
Link: https://doi.org/10.2494/..
 
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12

Estimation of Optimum Electron-Beam Projection Lithography ..:

Kobinata, Hideo ; Yamada, Yasuhisa ; Tamura, Takao...
Japanese Journal of Applied Physics.  42 (2003)  Part 1, No. 6B - p. 3816-3821 , 2003
Link: https://doi.org/10.1143/..
 
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13

Mask Error Factor in Proximity X-Ray Lithography:

Fujii, Kiyoshi ; Suzuki, Katsumi ; Matsui, Yasuji
Japanese Journal of Applied Physics.  39 (2000)  12S - p. 6947 , 2000
Link: https://doi.org/10.1143/..
 
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14

Identification of a RFLP Marker Tightly Linked to the Panic..:

Fujii, Kiyoshi ; Hayano-Saito, Yuriko ; Saito, Koji...
Breeding Science.  50 (2000)  3 - p. 183-188 , 2000
Link: https://doi.org/10.1270/..
 
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15

Optimum Phase Condition for Low-Contrast X-Ray Masks:

Fujii, Kiyoshi ; Suzuki, Katsumi ; Matsui, Yasuji
Japanese Journal of Applied Physics.  38 (1999)  12S - p. 7076 , 1999
Link: https://doi.org/10.1143/..
 
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