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Fujii, Kiyoshi
567
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Articles (Online) (465)
Bookchapter (Online) (7)
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1
Investigating the Mechanisms Underlying the Durability and ..:
Fujii, Kiyoshi
;
Suzuki, Taro
;
Nakamura, Mitsuru
...
Agronomy. 13 (2023) 7 - p. 1751 , 2023
Link:
https://doi.org/10.3390/..
?
2
Decoupled Current Vector Control of Dual Three Phase PMSM D..:
Wang, Shen
;
Doki, Shinji
;
Suzuki, Takashi
..
IEEJ Journal of Industry Applications. 11 (2022) 6 - p. 779-789 , 2022
Link:
https://doi.org/10.1541/..
?
3
Discovery of BMS-986235/LAR-1219: A Potent Formyl Peptide R..:
Asahina, Yoshikazu
;
Wurtz, Nicholas R.
;
Arakawa, Kazuto
...
Journal of Medicinal Chemistry. 63 (2020) 17 - p. 9003-9019 , 2020
Link:
https://doi.org/10.1021/..
?
4
Urinary retention occurring one week after spinal anesthesi..:
Fujii, Kiyoshi
;
Moriwaki, Katsuyuki
;
Torii, Tsuyoshi
...
Canadian Journal of Anesthesia/Journal canadien d'anesthésie. 62 (2014) 1 - p. 50-53 , 2014
Link:
https://doi.org/10.1007/..
?
5
Maintained root length density contributes to the waterlogg..:
Hayashi, Tomohito
;
Yoshida, Tomofumi
;
Fujii, Kiyoshi
...
Field Crops Research. 152 (2013) - p. 27-35 , 2013
Link:
https://doi.org/10.1016/..
?
6
Applicability of 'glume color' controlled by Rg-B1 locus as..:
Fujii, Kiyoshi
;
Tsuji, Takako
;
Yoshida, Tomofumi
..
Breeding Science. 61 (2011) 1 - p. 11-16 , 2011
Link:
https://doi.org/10.1270/..
?
7
A study of 193-nm immersion lithography using novel high re..:
Santillan, Julius
;
Otoguro, Akihiko
;
Itani, Toshiro
...
Microelectronic Engineering. 83 (2006) 4-9 - p. 651-654 , 2006
Link:
https://doi.org/10.1016/..
?
8
Intrinsic Problem Affecting Contact Hole Resolution in Hype..:
Matsuura, Seiji
;
Kurose, Eiji
;
Fujii, Kiyoshi
Japanese Journal of Applied Physics. 44 (2005) 7S - p. 5489 , 2005
Link:
https://doi.org/10.1143/..
?
9
Dissolution behavior of tetrafluoroethylene-based fluoropol..:
Ishikawa, Takuji
;
Kodani, Tesuhiro
;
Yoshida, Tomohiro
...
Journal of Fluorine Chemistry. 125 (2004) 11 - p. 1791-1799 , 2004
Link:
https://doi.org/10.1016/..
?
10
A New Monocyclic Fluoropolymer for 157-nm Photoresists:
Sasaki, Takashi
;
Takebe, Yoko
;
eda, Masataka
...
Journal of Photopolymer Science and Technology. 17 (2004) 4 - p. 639-644 , 2004
Link:
https://doi.org/10.2494/..
?
11
Application of a New BARC Material for 157-nm Lithography:
Shigematu, Masato
;
Irie, Shigeo
;
Sakamoto, Rikimaru
...
Journal of Photopolymer Science and Technology. 17 (2004) 4 - p. 665-670 , 2004
Link:
https://doi.org/10.2494/..
?
12
Estimation of Optimum Electron-Beam Projection Lithography ..:
Kobinata, Hideo
;
Yamada, Yasuhisa
;
Tamura, Takao
...
Japanese Journal of Applied Physics. 42 (2003) Part 1, No. 6B - p. 3816-3821 , 2003
Link:
https://doi.org/10.1143/..
?
13
Mask Error Factor in Proximity X-Ray Lithography:
Fujii, Kiyoshi
;
Suzuki, Katsumi
;
Matsui, Yasuji
Japanese Journal of Applied Physics. 39 (2000) 12S - p. 6947 , 2000
Link:
https://doi.org/10.1143/..
?
14
Identification of a RFLP Marker Tightly Linked to the Panic..:
Fujii, Kiyoshi
;
Hayano-Saito, Yuriko
;
Saito, Koji
...
Breeding Science. 50 (2000) 3 - p. 183-188 , 2000
Link:
https://doi.org/10.1270/..
?
15
Optimum Phase Condition for Low-Contrast X-Ray Masks:
Fujii, Kiyoshi
;
Suzuki, Katsumi
;
Matsui, Yasuji
Japanese Journal of Applied Physics. 38 (1999) 12S - p. 7076 , 1999
Link:
https://doi.org/10.1143/..
1-15