Fujisawa, Tomohisa
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1

Novel EUV Resist Development for Sub-14nm Half Pitch:

Kimoto, Takakazu ; Naruoka, Takehiko ; Nakagawa, Hisashi...
Journal of Photopolymer Science and Technology.  28 (2015)  4 - p. 519-523 , 2015
 
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2

Novel EUV Resists Materials for 16nm HP and beyond:

Sakai, Kazunori ; Shiratani, Motohiro ; Fujisawa, Tomohisa...
Journal of Photopolymer Science and Technology.  27 (2014)  5 - p. 639-644 , 2014
 
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3

LER Limitations of Resist Thin Films:

Cardineau, Brian ; Early, William ; Fujisawa, Tomohisa...
Journal of Photopolymer Science and Technology.  25 (2012)  5 - p. 633-640 , 2012
 
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4

Non Topcoat Self-freezing Photoresist for Double Patterning..:

Ito, Koji ; Mita, Michihiro ; Wakamatsu, Goji...
Journal of Photopolymer Science and Technology.  23 (2010)  2 - p. 199-204 , 2010
 
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12

Schizophyllan–folate conjugate as a new non-cytotoxic and c..:

Hasegawa, Teruaki ; Fujisawa, Tomohisa ; Haraguchi, Shuichi...
Bioorganic & Medicinal Chemistry Letters.  15 (2005)  2 - p. 327-330 , 2005
 
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