I agree that this site is using cookies. You can find further informations
here
.
X
Login
My folder (
0
)
Home
About us
Home About us
Our history
Profile
Press & public relations
Friends
The library in figures
Exhibitions
Projects
Training, internships, careers
Films
Services & Information
Home Services & Information
Lending and interlibrary loans
Returns and renewals
Training and library tours
My Account
Library cards
New to the library?
Download Information
Opening hours
Learning spaces
PC, WLAN, copy, scan and print
Catalogs and collections
Home Catalogs and Collections
Rare books and manuscripts
Digital collections
Subject Areas
Our sites
Home Our sites
Central Library
Law Library (Juridicum)
BB Business and Economics (BB11)
BB Physics and Electrical Engineering
TB Engineering and Social Sciences
TB Economics and Nautical Sciences
TB Music
TB Art & Design
TB Bremerhaven
Contact the library
Home Contact the library
Staff Directory
Open access & publishing
Home Open access & publishing
Reference management: Citavi & RefWorks
Publishing documents
Open Access in Bremen
Show Desktop-Version
Toggle navigation
Fukasawa, Masanaga
32
results:
Search for persons
X
Format
Online (32)
Mediatypes
Articles (Online) (31)
OpenAccess-fulltext (1)
Sorted by: Relevance
Sorted by: Year
?
1
Surface chemical reactions of etch stop prevention in plasm..:
Tercero, Jomar U.
;
Hirata, Akiko
;
Isobe, Michiro
...
Surface and Coatings Technology. 477 (2024) - p. 130365 , 2024
Link:
https://doi.org/10.1016/..
?
2
Radical, ion, and photon's effects on defect generation at ..:
Nunomura, Shota
;
Tsutsumi, Takayoshi
;
Takada, Noriharu
..
Applied Surface Science. , 2024
Link:
https://doi.org/10.1016/..
?
3
High-throughput SiN ALE: surface reaction and ion-induced d..:
Hirata, Akiko
;
Fukasawa, Masanaga
;
Tercero, Jomar Unico
...
Japanese Journal of Applied Physics. 62 (2023) SI - p. SI1015 , 2023
Link:
https://doi.org/10.35848..
?
4
Five-step plasma-enhanced atomic layer etching of silicon n..:
Hirata, Akiko
;
Fukasawa, Masanaga
;
Tercero, Jomar U.
...
Japanese Journal of Applied Physics. 61 (2022) 6 - p. 066002 , 2022
Link:
https://doi.org/10.35848..
?
5
Structural and electrical characteristics of ion-induced Si..:
Hirata, Akiko
;
Fukasawa, Masanaga
;
Kugimiya, Katsuhisa
...
Japanese Journal of Applied Physics. 61 (2022) SI - p. SI1003 , 2022
Link:
https://doi.org/10.35848..
?
6
Damage recovery and low‐damage etching of ITO in H2/CO plas..:
Hirata, Akiko
;
Fukasawa, Masanaga
;
Kugimiya, Katsuhisa
...
Plasma Processes and Polymers. 16 (2019) 9 - p. , 2019
Link:
https://doi.org/10.1002/..
?
7
Enhanced etching of tin-doped indium oxide due to surface m..:
Li, Hu
;
Karahashi, Kazuhiro
;
Friederich, Pascal
...
Japanese Journal of Applied Physics. 57 (2018) 6S2 - p. 06JC05 , 2018
Link:
https://doi.org/10.7567/..
?
8
Cyclic etching of tin-doped indium oxide using hydrogen-ind..:
Hirata, Akiko
;
Fukasawa, Masanaga
;
Nagahata, Kazunori
...
Japanese Journal of Applied Physics. 57 (2018) 6S2 - p. 06JB02 , 2018
Link:
https://doi.org/10.7567/..
?
9
Effects of hydrogen-damaged layer on tin-doped indium oxide..:
Hirata, Akiko
;
Fukasawa, Masanaga
;
Shigetoshi, Takushi
...
Japanese Journal of Applied Physics. 56 (2017) 6S2 - p. 06HD02 , 2017
Link:
https://doi.org/10.7567/..
?
10
Mass-selected ion beam study on etching characteristics of ..:
Li, Hu
;
Karahashi, Kazuhiro
;
Fukasawa, Masanaga
...
Japanese Journal of Applied Physics. 55 (2016) 2 - p. 021202 , 2016
Link:
https://doi.org/10.7567/..
?
11
Advanced simulation technology for etching process design f..:
Kuboi, Nobuyuki
;
Fukasawa, Masanaga
;
Tatsumi, Tetsuya
Japanese Journal of Applied Physics. 55 (2016) 7S2 - p. 07LA02 , 2016
Link:
https://doi.org/10.7567/..
?
12
Molecular dynamics simulation of silicon oxidation enhanced..:
Mizotani, Kohei
;
Isobe, Michiro
;
Fukasawa, Masanaga
...
Journal of Physics D: Applied Physics. 48 (2015) 15 - p. 152002 , 2015
Link:
https://doi.org/10.1088/..
?
13
Control of SiO2/Si interface defects generation during thin..:
Shigetoshi, Takushi
;
Fukasawa, Masanaga
;
Nagahata, Kazunori
.
Japanese Journal of Applied Physics. 54 (2015) 6S2 - p. 06GB05 , 2015
Link:
https://doi.org/10.7567/..
?
14
Characterization of polymer layer formation during SiO2/SiN..:
Miyake, Keita
;
Ito, Tomoko
;
Isobe, Michiro
...
Japanese Journal of Applied Physics. 53 (2014) 3S2 - p. 03DD02 , 2014
Link:
https://doi.org/10.7567/..
?
15
Wavelength Dependence of Photon-Induced Interface Defects i..:
Fukasawa, Masanaga
;
Matsugai, Hiroyasu
;
Honda, Takahiro
...
Japanese Journal of Applied Physics. 52 (2013) 5S2 - p. 05ED01 , 2013
Link:
https://doi.org/10.7567/..
1-15