Gregušová, D
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1

Local increase in compressive strain (GaN) in gate recessed..:

Mikulics, M ; Kordoš, P ; Gregušová, D...
Semiconductor Science and Technology.  36 (2021)  9 - p. 095040 , 2021
 
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Impact of oxide/barrier charge on threshold voltage instabi..:

Ťapajna, M. ; Drobný, J. ; Gucmann, F....
Materials Science in Semiconductor Processing.  91 (2019)  - p. 356-361 , 2019
 
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Corrigendum to "Impact of oxide/barrier charge on threshold..:

Ťapajna, M. ; Drobný, J. ; Gucmann, F....
Materials Science in Semiconductor Processing.  93 (2019)  - p. 381 , 2019
 
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9

Influence of oxygen-plasma treatment on AlGaN/GaN metal-oxi..:

Stoklas, R ; Gregušová, D ; Blaho, M...
Semiconductor Science and Technology.  32 (2017)  4 - p. 045018 , 2017
 
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11

High resolution physical analysis of ohmic contact formatio..:

Graff, A. ; Simon-Najasek, M. ; Altmann, F....
Microelectronics Reliability.  76-77 (2017)  - p. 338-343 , 2017
 
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14

Technology of integrated self-aligned E/D-mode n++GaN/InAlN..:

Blaho, M ; Gregušová, D ; Haščík, Š...
Semiconductor Science and Technology.  31 (2016)  6 - p. 065011 , 2016
 
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