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2016 16th International Workshop on Junction Technology (IWJT) ,
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10 nm-deep n+/p and p+/n Ge junctions with high activation ..:
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2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) ,
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Optimization of implant and anneal processes:
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2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology ,
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Cluster Carbon ion implantation for NMOS device fabrication..:
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2010 International Workshop on Junction Technology Extended Abstracts ,
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Carrier activation in cluster boron implanted Si:
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2006 International Workshop on Junction Technology ,
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High quality ion implanter; EXCEED3000AH-Nx for 45nm beyond..:
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2006 International Workshop on Junction Technology ,
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Advantageous Decaborane Ion Implantation for Ultra-shallow ..:
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Extended Abstracts of the Fifth International Workshop on Junction Technology ,
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Decaborane ion implantation for sub-40-nm gate-length PMOSF..:
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Proceedings. 7th International Conference on Solid-State and Integrated Circuits Technology, 2004. ,
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