Hendrickx, Eric
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1

Mask innovations on the eve of high NA EUV lithography:

Philipsen, Vicky ; Frommhold, Andreas ; Thakare, Devesh...
Japanese Journal of Applied Physics.  63 (2024)  4 - p. 040804 , 2024
 
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3

Progresses and Challenges of EUV Lithography Materials:

Simone, Danilo De ; Goethals, Anne Marie ; Roey, Frieda Van...
Journal of Photopolymer Science and Technology.  27 (2014)  5 - p. 601-610 , 2014
 
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4

Readiness of EUV Lithography for Insertion into Manufacturi..:

Hendrickx, Eric ; Gronheid, Roel ; Hermans, Jan...
Journal of Photopolymer Science and Technology.  26 (2013)  5 - p. 587-593 , 2013
 
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5

High Refractive Index Fluid Evaluations at 193nm: Fluid Lif..:

Tran, Hoang V. ; Hendrickx, Eric ; French, Roger H....
Journal of Photopolymer Science and Technology.  21 (2008)  5 - p. 631-639 , 2008
 
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6

The Magnitude of Potential Exposure-Tool-Induced Critical D..:

Chiou, Tsann-Bim ; Chen, Alek C. ; Tseng, Shih-En...
Japanese Journal of Applied Physics.  43 (2004)  6S - p. 3672 , 2004
 
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