E-LIB Suche - Ergebnisse für: Hsiao, Shih-Nan

1

Surface sulfurization of amorphous carbon films in the chem..:

Ishikawa, Kenji ; Nguyen, Thi-Thuy-Nga ; Aoki, Yuta...
Applied Surface Science. 645 (2024) - p. 158876 , 2024

Link: https://doi.org/10.1016/..

2

Surface surgery on TiNb2O7 electrode via N2/Air atmospheric..:

Wu, Che-Ya ; Hsiao, Shih-Nan ; Kuo, Rui-Tung...
Applied Surface Science. 655 (2024) - p. 159585 , 2024

Link: https://doi.org/10.1016/..

3

Selective removal of single-layer graphene over double-laye..:

Hu, Liugang ; Ishikawa, Kenji ; Nguyen, Thi-Thuy-Nga..
Applied Surface Science. 669 (2024) - p. 160598 , 2024

Link: https://doi.org/10.1016/..

4

Oxidation-induced surface stress on texture development of ..:

Hsiao, Shih-Nan
Vacuum. 225 (2024) - p. 113288 , 2024

Link: https://doi.org/10.1016/..

5

Manipulation of etch selectivity of silicon nitride over si..:

Hsiao, Shih-Nan ; Britun, Nikolay ; Nguyen, Thi-Thuy-Nga...
Vacuum. 210 (2023) - p. 111863 , 2023

Link: https://doi.org/10.1016/..

6

In Situ Monitoring of Etching Characteristic and Surface Re..:

Hsiao, Shih-Nan ; Sekine, Makoto ; Hori, Masaru
ACS Applied Materials & Interfaces. 15 (2023) 29 - p. 35622-35630 , 2023

Link: https://doi.org/10.1021/..

7

Comparison of distributions of etching rate and calculated ..:

Takagi, Shigeyuki ; Ishii, Kazumichi ; Hsiao, Shih-Nan.
Japanese Journal of Applied Physics. 62 (2023) SN - p. SN1011 , 2023

Link: https://doi.org/10.35848..

8

High-Power Impulse Magnetron Sputter-Deposited Chromium-Bas..:

Liu, Yen-Chun ; Hsiao, Shih-Nan ; Chen, Ying-Hung..
Coatings. 13 (2023) 12 - p. 2101 , 2023

Link: https://doi.org/10.3390/..

9

Bias-supply timing tailored to the aspect ratio dependence ..:

Yoshie, Taito ; Ishikawa, Kenji ; Nguyen, Thi-Thuy-Nga...
Applied Surface Science. 638 (2023) - p. 157981 , 2023

Link: https://doi.org/10.1016/..

10

Diagnostics of a nanosecond atmospheric plasma jet. Ionizat..:

Britun, Nikolay ; Dennis Christy, Peter Raj ; Gamaleev, Vladislav..
Journal of Applied Physics. 133 (2023) 18 - p. , 2023

Link: https://doi.org/10.1063/..

11

Optimization of RF Frequencies in Dual-Frequency Capacitive..:

Takagi, Shigeyuki ; Sekine, Makoto ; Nakaegawa, Tatsuhiro.
IEEE Transactions on Semiconductor Manufacturing. 36 (2023) 4 - p. 547-552 , 2023

Link: https://doi.org/10.1109/..

12

Estimations of secondary electron emission coefficients of ..:

Takagi, Shigeyuki ; Nakaegawa, Tatsuhiro ; Hsiao, Shih-Nan.
Japanese Journal of Applied Physics. 62 (2022) SA - p. SA1009 , 2022

Link: https://doi.org/10.35848..

13

Optimization of RF Frequencies in Dual-frequency Capacitive..:

, In: 2022 International Symposium on Semiconductor Manufacturing (ISSM),

Takagi, Shigeyuki ; Nakaegawa, Tatsuhiro ; Hsiao, Shih-Nan. - p. 1-3 , 2022

Link: https://doi.org/10.1109/..

14

Plasma Diagnostics and Characteristics of Hydrofluorocarbon..:

, In: 2022 International Symposium on Semiconductor Manufacturing (ISSM),

Hsiao, Shih-Nan ; Imai, Yusuke ; Britrun, Nikolay... - p. 1-3 , 2022

Link: https://doi.org/10.1109/..

15

Influences of substrate temperatures on etch rates of PECVD..:

Hsiao, Shih-Nan ; Nakane, Kazuya ; Tsutsumi, Takayoshi...
Applied Surface Science. 542 (2021) - p. 148550 , 2021

Link: https://doi.org/10.1016/..