Hsu, Chen-Feng
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2

Contact Optimization Through Annealing and Edge Functionali..:

, In: 2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA),
 
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3

Chalcogenide Selectors for Low Voltage and High Density Mem..:

, In: 2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA),
 
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5

Forming-Free Selectors Based on Te in an Insulating SiO x M..:

Datye, Isha M. ; Vaziri, Sam ; Ambrosi, Elia...
IEEE Transactions on Electron Devices.  71 (2024)  1 - p. 530-535 , 2024
 
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6

Status and Performance of Integration Modules Toward Scaled..:

, In: 2023 International Electron Devices Meeting (IEDM),
 
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7

High-Endurance MoS2 FeFET with Operating Voltage Fess Than ..:

, In: 2023 International Electron Devices Meeting (IEDM),
 
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9

Comprehensive Study of Contact Length Scaling Down to 12 nm..:

Wu, Wen-Chia ; Hung, Terry Y. T. ; Sathaiya, D. Mahaveer...
IEEE Transactions on Electron Devices.  70 (2023)  12 - p. 6680-6686 , 2023
 
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10

Monolayer-MoS2 Stacked Nanosheet Channel with C-type Metal ..:

, In: 2023 International Electron Devices Meeting (IEDM),
 
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12

Scaled contact length with low contact resistance in monola..:

, In: 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits),
 
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13

Sub-Nanometer Interfacial Oxides on Highly Oriented Pyrolyt..:

Zhang, Zichen ; Passlack, Matthias ; Pitner, Gregory...
ACS Applied Materials & Interfaces.  14 (2022)  9 - p. 11873-11882 , 2022
 
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14

Reliable Low Voltage Selector Device Technology Based on Ro..:

Ambrosi, Elia ; Wu, Cheng-Hsien ; Lee, Heng-Yuan...
IEEE Electron Device Letters.  43 (2022)  10 - p. 1673-1676 , 2022
 
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15

First Demonstration of GAA Monolayer-MoS2 Nanosheet nFET wi..:

, In: 2022 International Electron Devices Meeting (IEDM),
Chung, Yun-Yan ; Chou, Bo-Jhih ; Hsu, Chen-Feng... - p. 34.5.1-34.5.4 , 2022
 
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