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Itoga, Toshihiko
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Online (24)
Mediatypes
Articles (Online) (21)
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1
12.1: 45°C Low‐Temperature Poly‐Si TFT Fabrication Process ..:
Ohkura, Makoto
;
Shimomura, Shigeo
;
Miyazawa, Toshio
..
SID Symposium Digest of Technical Papers. 33 (2002) 1 - p. 146-149 , 2002
Link:
https://doi.org/10.1889/..
?
2
P‐6: A Design Robust Against Hot‐carrier Stress for Low‐tem..:
Shiba, Takeo
;
Itoga, Toshihiko
;
Toyota, Yoshiaki
...
SID Symposium Digest of Technical Papers. 33 (2002) 1 - p. 220-223 , 2002
Link:
https://doi.org/10.1889/..
?
3
New Technique to Determine Gettering Efficiency of Heavy Me..:
Itoga, Toshihiko
;
Hozawa, Kazuyuki
;
Takeda, Kazuo
..
Japanese Journal of Applied Physics. 40 (2001) 4R - p. 2105 , 2001
Link:
https://doi.org/10.1143/..
?
4
The Effect of Isopropyl Alcohol Adsorption on the Electrica..:
Motai, Kumi
;
Itoga, Toshihiko
;
Irie, Takashi
Japanese Journal of Applied Physics. 37 (1998) 3S - p. 1137 , 1998
Link:
https://doi.org/10.1143/..
?
5
The Increase of the Native Oxide Thickness on H-Terminated ..:
Itoga, Toshihiko
;
Kojima, Hisao
;
Jiro Yugami, Jiro Yugami
.
Japanese Journal of Applied Physics. 36 (1997) 3S - p. 1578 , 1997
Link:
https://doi.org/10.1143/..
?
6
Degradation of n+/p Junction Characteristics by Aluminum Co..:
Itoga, Toshihiko
;
Kojima, Hisao
;
Atsushi Hiraiwa, Atsushi Hiraiwa
.
Japanese Journal of Applied Physics. 36 (1997) 7R - p. 4431 , 1997
Link:
https://doi.org/10.1143/..
?
7
X-Ray Photoelectron Spectroscopy Study of Native Oxidation ..:
Yano, Fumiko
;
Toshihiko Itoga, Toshihiko Itoga
;
Keiichi Kanehori, Keiichi Kanehori
Japanese Journal of Applied Physics. 36 (1997) 6A - p. L670 , 1997
Link:
https://doi.org/10.1143/..
?
8
Influence of ion-implantation on native oxidation of Si in ..:
Yano, Fumiko
;
Hiraoka, Akiko
;
Itoga, Toshihiko
...
Applied Surface Science. 100-101 (1996) - p. 138-142 , 1996
Link:
https://doi.org/10.1016/..
?
9
A Ceramic Plasma Torch for Determining Silicon Content in H..:
Matsubara, Atsuko
;
Kojima, Hisao
;
Toshihiko Itoga, Toshihiko Itoga
.
Japanese Journal of Applied Physics. 35 (1996) 8R - p. 4541 , 1996
Link:
https://doi.org/10.1143/..
?
10
Development of ammonia adsorption filter and its applicatio..:
SAIKI, Atsushi
;
OSHIO, Ryoji
;
SUZUKI, Michio
...
Journal of Photopolymer Science and Technology. 8 (1995) 4 - p. 599-606 , 1995
Link:
https://doi.org/10.2494/..
?
11
Ultra-Shallow Depth Profiling of Arsenic Implants in Silico..:
Matsubara, Atsuko
;
Kojima, Hisao
;
Itoga, Toshihiko
.
Japanese Journal of Applied Physics. 34 (1995) 8R - p. 3965 , 1995
Link:
https://doi.org/10.1143/..
?
12
Development of Ammonia Adsorption Filter and Its Applicatio..:
Saiki, Atsushi
;
Oshio, Ryoji
;
Suzuki, Michio
...
Japanese Journal of Applied Physics. 33 (1994) 5R - p. 2504 , 1994
Link:
https://doi.org/10.1143/..
?
13
Improving hot-electron hardness of narrow channel MOSFETs b..:
Nishioka, Yasushiro
;
Itoga, Toshihiko
;
Ohyu, Kiyonori
.
Solid-State Electronics. 34 (1991) 11 - p. 1197-1200 , 1991
Link:
https://doi.org/10.1016/..
?
14
Photoluminescence and Acceptor State of Na in ZnSe:
Isshiki, Minoru
;
Itoga, Toshihiko
;
Masumoto, Katashi
.
Japanese Journal of Applied Physics. 30 (1991) 4R - p. 623 , 1991
Link:
https://doi.org/10.1143/..
?
15
Advantages of Fluorine Introduction in Boron Implanted Shal..:
Ohyu, Kiyonori
;
Itoga, Toshihiko
;
Natsuaki, Nobuyoshi
Japanese Journal of Applied Physics. 29 (1990) 3R - p. 457 , 1990
Link:
https://doi.org/10.1143/..
1-15