Jagdhold, U.
10  results:
Search for persons X
?
1

Electron beam lithography over topography:

Bauch, L. ; Jagdhold, U. ; Böttcher, M.
Microelectronic Engineering.  30 (1996)  1-4 - p. 53-56 , 1996
 
?
 
?
 
?
4

Resist process to join electron beam lithography and photol..:

Bauch, L. ; Bo¨ttcher, M. ; Jagdhold, U.
Microelectronic Engineering.  27 (1995)  1-4 - p. 371-374 , 1995
 
?
5

Antimony implantation into Si-B doping superlattices—damage..:

Krüger, D. ; Jagdhold, U. ; Kurps, R..
Journal of Applied Physics.  78 (1995)  8 - p. 5008-5012 , 1995
 
?
 
?
7

Dry etching pattern transfer of 0.3 μm structures in techno..:

Bauch, L. ; Wolff, A. ; Jagdhold, U...
Microelectronic Engineering.  23 (1994)  1-4 - p. 377-380 , 1994
 
?
8

Passivation effects in novolak based resists during O2-RIE:

Jagdhold, U. ; Pelka, J.
Microelectronic Engineering.  17 (1992)  1-4 - p. 331-335 , 1992
 
?
9

Submicrometer photolithography by surface imaging - experim..:

Bauch, L. ; Jagdhold, U. ; Bauer, J....
Microelectronic Engineering.  13 (1991)  1-4 - p. 89-92 , 1991
 
?
10

Optical proximity correction for 0.13 um SiGe:C BiCMOS:

Geisler, Sebastian ; Bauer, Joachim ; Haak, Ulrich...
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1519.  , 2008
 
1-10